Z<sup>2</sup>-FET Memory with Both Flash and DRAM Modes

In this study, we develop a novel memory device based on Z<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>-FET. Our memory device exhibits dual-mode operation as either flash or DRAM (dynamic random access memory) under different bias conditions. The functionality is validated through TCAD simulations. The flash memory mode is achieved by integrating an engineered gate dielectric for charge storage in the Z<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>-FET. In flash mode, data readout is innovatively achieved by applying voltage from the source in order to avoid triggering the transient feedback used in DRAM mode. In DRAM mode, the charge stored in gate capacitor is read out through feedback mechanism. The flash and DRAM modes demonstrate non-volatile and fast access speed characteristics, respectively. Eventually, a process based on fully depleted silicon-on-insulator (FD-SOI) substrate is developed to fabricate the dual-mode Z<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>-FET memory which is further subjected to preliminary measurements.

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Publication Details

Published
2025-03-24
DOI
https://doi.org/10.1109/cstic64481.2025.11017972
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.00

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article

Z2-FET Memory with Both Flash and DRAM Modes

Bing Tian, Yingxin Chen, Xiaolan Tang, Jing Wan
Semiconductor materials and devices
article

Z2-FET Memory with Both Flash and DRAM Modes

Bing Tian, Yingxin Chen, Xiaolan Tang, Jing Wan
article en

Abstract

In this study, we develop a novel memory device based on Z<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>-FET. Our memory device exhibits dual-mode operation as either flash or DRAM (dynamic random access memory) under different bias conditions. The functionality is validated through TCAD simulations. The flash memory mode is achieved by integrating an engineered gate dielectric for charge storage in the Z<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>-FET. In flash mode, data readout is innovatively achieved by applying voltage from the source in order to avoid triggering the transient feedback used in DRAM mode. In DRAM mode, the charge stored in gate capacitor is read out through feedback mechanism. The flash and DRAM modes demonstrate non-volatile and fast access speed characteristics, respectively. Eventually, a process based on fully depleted silicon-on-insulator (FD-SOI) substrate is developed to fabricate the dual-mode Z<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>-FET memory which is further subjected to preliminary measurements.

Fudan University (CN)
Natural Science Foundation of Shanghai, National Natural Science Foundation of China
Openalex Percentile: Top 90%
Semiconductor materials and devices
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