Investigation of NOR flash Floating Gate (FG) Residue defect improve

Floating gate (FG) residue is one of the major defects of NOR Flash products, introduction of "ox loss" concept and through the past data research "ox loss" relationship with the defect, the study found that ox loss and defect fail was significantly negative correlation, and different products have different "ox loss" threshold. Fail bin and ox loss curve has the same turning point as the above methods, show that the method can get considerable credibility of ox loss data. Further, combining with the defect and CP data can determine the appropriate ox loss control value. Based on the mechanism of defect, put forward to solve the defects of process improvement direction: adjust the STI CMP or CVT WET extend the FG CMP window. Choose one of the direction to design experiment, the results show that "STI CMP OP-" can effectively improve the FG CMP window.

Authors

Institutions

Publication Details

Published
2025-03-24
DOI
https://doi.org/10.1109/cstic64481.2025.11017955
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Investigation of NOR flash Floating Gate (FG) Residue defect improve

Qiliang Ni, Qiufeng Cao, Junwei Han, Guangzhi He et al.
Integrated Circuits and Semiconductor Failure Analysis
article

Investigation of NOR flash Floating Gate (FG) Residue defect improve

Qiliang Ni, Qiufeng Cao, Junwei Han, Guangzhi He, Yanmin Duan, Chao Han
article en

Abstract

Floating gate (FG) residue is one of the major defects of NOR Flash products, introduction of "ox loss" concept and through the past data research "ox loss" relationship with the defect, the study found that ox loss and defect fail was significantly negative correlation, and different products have different "ox loss" threshold. Fail bin and ox loss curve has the same turning point as the above methods, show that the method can get considerable credibility of ox loss data. Further, combining with the defect and CP data can determine the appropriate ox loss control value. Based on the mechanism of defect, put forward to solve the defects of process improvement direction: adjust the STI CMP or CVT WET extend the FG CMP window. Choose one of the direction to design experiment, the results show that "STI CMP OP-" can effectively improve the FG CMP window.

Shanghai Huali Microelectronics (China) (CN)
Openalex Percentile: Top 90%
Integrated Circuits and Semiconductor Failure Analysis
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.