Sym3™ Lid Temperature Control System for Uniformity Improvement

The lid temperature control system plays a critical role in maintaining process environment, particularly by managing thermal conditions within etch chamber. More importantly, when facing different processes and recipes, and if the chamber idle time is too long, the first-wafer effect is triggered <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">[1]</sup>. Maintaining a stable and uniform process temperature is incredibly challenging, Sym3™ lid temperature control system is fully capable of doing this. In this paper, the configuration and mechanisms will be introduced. This study explains how the entire system co-worked, interconnected to achieve the uniform and desired temperature for lid, reflected in etch rate (ER) uniformity [2].