Correction Model for Plate Mapping Error Based on Acceleration and Deceleration of Plate Stage

In a Flat Panel Display lithography machine, plate mapping is completed in the uniform scanning state of the plate stage, plate alignment uses CCD alignment and is completed in the stationary state of the plate stage. To improve throughput, we propose a scheme to combine the plate mapping and plate alignment processes. The new scheme will introduce a new problem, resulting in an error in the mapping result. This paper analyzes the correlation between the acceleration and deceleration of the plate stage and plate mapping errors and presents a correction model. With the correction model, experiment shows that plate mapping error is reduced by 80%, which meets the requirements of exposure imaging quality.

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Publication Details

Published
2025-03-24
DOI
https://doi.org/10.1109/cstic64481.2025.11017986
Primary Topic
Optical measurement and interference techniques
Type
article
Field-Weighted Citation Impact
0.00

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article

Correction Model for Plate Mapping Error Based on Acceleration and Deceleration of Plate Stage

Zhanzhan Chu, Yuebin Zhu, Chang Zhou, Wenbin Dai et al.
Optical measurement and interference techniques
article

Correction Model for Plate Mapping Error Based on Acceleration and Deceleration of Plate Stage

Zhanzhan Chu, Yuebin Zhu, Chang Zhou, Wenbin Dai, Yuzhi Li
article en

Abstract

In a Flat Panel Display lithography machine, plate mapping is completed in the uniform scanning state of the plate stage, plate alignment uses CCD alignment and is completed in the stationary state of the plate stage. To improve throughput, we propose a scheme to combine the plate mapping and plate alignment processes. The new scheme will introduce a new problem, resulting in an error in the mapping result. This paper analyzes the correlation between the acceleration and deceleration of the plate stage and plate mapping errors and presents a correction model. With the correction model, experiment shows that plate mapping error is reduced by 80%, which meets the requirements of exposure imaging quality.

Shanghai Jiao Tong University (CN), Shanghai Micro Electronics Equipment (China) (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 89%
Optical measurement and interference techniques
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Correction Model for Plate Mapping Error Based on Acceleration and Deceleration of Plate Stage — Zhanzhan Chu, Yuebin Zhu, et al. · (2025) | TGRS Research Map | TGRS