Correction Model for Plate Mapping Error Based on Acceleration and Deceleration of Plate Stage
In a Flat Panel Display lithography machine, plate mapping is completed in the uniform scanning state of the plate stage, plate alignment uses CCD alignment and is completed in the stationary state of the plate stage. To improve throughput, we propose a scheme to combine the plate mapping and plate alignment processes. The new scheme will introduce a new problem, resulting in an error in the mapping result. This paper analyzes the correlation between the acceleration and deceleration of the plate stage and plate mapping errors and presents a correction model. With the correction model, experiment shows that plate mapping error is reduced by 80%, which meets the requirements of exposure imaging quality.
Authors
- Zhanzhan Chu
- Yuebin Zhu
- Chang Zhou (ORCID: https://orcid.org/0000-0002-7336-7351)
- Wenbin Dai (ORCID: https://orcid.org/0000-0001-6569-5868)
- Yuzhi Li (ORCID: https://orcid.org/0000-0002-5149-1300)
Institutions
- Shanghai Jiao Tong University (CN)
- Shanghai Micro Electronics Equipment (China) (CN)
Publication Details
- Published
- 2025-03-24
- DOI
- https://doi.org/10.1109/cstic64481.2025.11017986
- Primary Topic
- Optical measurement and interference techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China