A New Theory of High-K Electrode Material Versus Low-K Electrode Mterial for High-K Metal-Insulator-Metal Capacitors

In this paper, the author proposes his new theory that there are two kinds of electrode materials: high-k and low-k electrode materials. For example, RuO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>, IrO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> and SrRuO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> normally behave as conductors but can behave as high-k dielectric when depleted of free electrons. Metals normally behave as conductors but can behave as low-k dielectric when depleted of free electrons.

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Published
2025-03-24
DOI
https://doi.org/10.1109/cstic64481.2025.11018041
Primary Topic
Copper Interconnects and Reliability
Type
article
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article

A New Theory of High-K Electrode Material Versus Low-K Electrode Mterial for High-K Metal-Insulator-Metal Capacitors

W. S. Lau
Copper Interconnects and Reliability
article

A New Theory of High-K Electrode Material Versus Low-K Electrode Mterial for High-K Metal-Insulator-Metal Capacitors

W. S. Lau
article en

Abstract

In this paper, the author proposes his new theory that there are two kinds of electrode materials: high-k and low-k electrode materials. For example, RuO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>, IrO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> and SrRuO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> normally behave as conductors but can behave as high-k dielectric when depleted of free electrons. Metals normally behave as conductors but can behave as low-k dielectric when depleted of free electrons.

Nanyang Technological University (SG)
Affordable and clean energy
Openalex Percentile: Top 93%
Copper Interconnects and Reliability
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