Optimization of the Synthetic Process of Bis(Diethylamino)Silane Based on Response Surface Methodology

In this paper, the synthesis process of bis(diethylamino)silane (BDEAS) was optimized by response surface methodology to improve its application in self-aligned double patterning (SADP) technology. In the study, dichlorodihydrosilane (DCS) and diethylamine (DEA) were used as the raw materials. The fitted regression equations of the factors on the yield of BDEAS were established by the central component rotational design (CCRD) method in the Design-Expert 12 software, and an analysis of variance was carried out to determine the significant influencing factors. The optimal conditions obtained from the optimization were a molar ratio of DEA to DCS of 8.894, a reaction temperature of 4.666 °C, and a reaction time of 18.279 min, resulting in BDEAS reaction yield reached 74.619%.