Methodology on Adaptive Iterative Step in Inverse Lithography

The influence of iteration step on mask optimization performance in inverse lithography technology (ILT) is studied, and an adaptive iteration step algorithm is designed. A large iteration step may result in inability to converge, while a small step may lead to slow convergence and the possibility of getting stuck in a local optimal solution. Adaptive step in real-time based on changes of cost can balance efficiency and mask optimization effect. This method may contribute to the wider application of ILT in photolithography technology.