Effect of plasma etching on optical breakdown threshold of nonlinear ZnGeP2 crystals in wavelength region ~ 2.1 μm
Studies of the effect of plasma cleaning of the surface on the optical stability of monocrystal ZnGeP2 were carried out. A change in the threshold of optical breakdown was established at various parameters of plasma cleaning of the surface of crystals. When a polished ZnGeP2 surface is exposed to low-temperature plasma in an atmosphere with an electron concentration of 1014-1015 cm-3 at a voltage of 13-20 kV and a pulse repetition rate of 50-100 Hz, a 30% increase in the optical breakdown threshold of samples is observed during 500 000 pulses with ~ 40 ns duration.
Authors
- Maxim Kulesh
- В. С. Кузнецов (ORCID: https://orcid.org/0000-0002-1115-6495)
- Sergey Podzyvalov (ORCID: https://orcid.org/0000-0002-8513-837X)
- Elena Slyunko (ORCID: https://orcid.org/0009-0003-5952-2647)
- O.L. Antipov (ORCID: https://orcid.org/0000-0001-6095-6387)
- Э. А. Соснин
- A.B. Lysenko (ORCID: https://orcid.org/0000-0002-0342-5122)
- Д. А. Сорокин (ORCID: https://orcid.org/0000-0002-6884-2525)
- Д. В. Белоплотов (ORCID: https://orcid.org/0000-0001-7807-2520)
- Akmal Gabdrakhmanov
- Andrey Kalsin
- N. N. Yudin
- Mikhail Zinoviev
Publication Details
- Journal
- Izvestiya vysshikh uchebnykh zavedenii Fizika
- Published
- 2025-01-01
- DOI
- https://doi.org/10.17223/00213411/68/5/7
- Primary Topic
- Nonlinear Optical Materials Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00