The effect of two ECR zones on dual frequency inductively coupled plasma using a gradient DC magnetic field

The effect of a spatial gradient direct-current (DC) magnetic field on the evolution of the electron energy probability function was investigated in a dual frequency (DF) cylindrical inductively coupled plasma (ICP). The DF-ICP system was established using two independent one-turn antennas, with one placed in the upper part of the chamber powered by 13 MHz and the other in the lower part powered by 27.12 MHz. Different currents were applied to the upper and lower coils of the Helmholtz coil to form a gradient magnetic field, simultaneously satisfying the electron cyclotron resonance (ECR) condition at both 13 and 27.12 MHz frequencies. The significant increase in electron density and electron temperature observed under a gradient magnetic field can be attributed to the presence of two ECR heating zones within the chamber. Compared with uniform magnetic fields, which satisfy the ECR condition for only a single frequency in DF-ICP, the gradient magnetic field exhibited a more pronounced enhancement of electron density and electron temperature. This effect is primarily attributable to ECR heating and confinement of radial electron transport by a DC magnetic field. The effect of pressure on ECR heating was also investigated. As the pressure increased, frequent electron-neutral collisions disrupted the ECR process, leading to rapid weakening of the effect of the magnetic field, ultimately resulting in reduced electron density and electron temperature. These findings demonstrate that a gradient magnetic field can improve etching and sputtering in the processing of plasma materials at low pressure.

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Publication Details

Journal
Journal of Applied Physics
Published
2025-06-02
DOI
https://doi.org/10.1063/5.0271896
Primary Topic
Plasma Diagnostics and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

The effect of two ECR zones on dual frequency inductively coupled plasma using a gradient DC magnetic field

Ju-Ho Kim, Yilang Jiang, Chin‐Wook Chung, Myoung-Jae Lee et al.
Journal of Applied Physics
Plasma Diagnostics and Applications
article

The effect of two ECR zones on dual frequency inductively coupled plasma using a gradient DC magnetic field

Ju-Ho Kim, Yilang Jiang, Chin‐Wook Chung, Myoung-Jae Lee, Min-Seok Kim, You He
article en

Abstract

The effect of a spatial gradient direct-current (DC) magnetic field on the evolution of the electron energy probability function was investigated in a dual frequency (DF) cylindrical inductively coupled plasma (ICP). The DF-ICP system was established using two independent one-turn antennas, with one placed in the upper part of the chamber powered by 13 MHz and the other in the lower part powered by 27.12 MHz. Different currents were applied to the upper and lower coils of the Helmholtz coil to form a gradient magnetic field, simultaneously satisfying the electron cyclotron resonance (ECR) condition at both 13 and 27.12 MHz frequencies. The significant increase in electron density and electron temperature observed under a gradient magnetic field can be attributed to the presence of two ECR heating zones within the chamber. Compared with uniform magnetic fields, which satisfy the ECR condition for only a single frequency in DF-ICP, the gradient magnetic field exhibited a more pronounced enhancement of electron density and electron temperature. This effect is primarily attributable to ECR heating and confinement of radial electron transport by a DC magnetic field. The effect of pressure on ECR heating was also investigated. As the pressure increased, frequent electron-neutral collisions disrupted the ECR process, leading to rapid weakening of the effect of the magnetic field, ultimately resulting in reduced electron density and electron temperature. These findings demonstrate that a gradient magnetic field can improve etching and sputtering in the processing of plasma materials at low pressure.

Journal of Applied PhysicsVol. 137(21)
Hanyang University (KR)
Ministry of Trade, Industry and Energy, National Research Foundation of Korea, Korea Semiconductor Research Consortium
Openalex Percentile: Top 90%
Plasma Diagnostics and Applications
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