Engineered semiconductor-dielectric interfaces in polymer ferroelectric transistors

A comparison of atomic layer deposited Al 2 O 3 on PVDF-based copolymers in polymer transistors shows a significant improvement in the subthreshold swing for PVDF-HFP devices compared with PVDF-TrFE. Al 2 O 3 passivates the interfacial traps.

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Publication Details

Journal
Journal of Materials Chemistry C
Published
2025-01-01
DOI
https://doi.org/10.1039/d5tc01378j
Citations
1
Primary Topic
Analytical Chemistry and Sensors
Type
article
Field-Weighted Citation Impact
0.74

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article

Engineered semiconductor-dielectric interfaces in polymer ferroelectric transistors

Andrew C. Meng, S. Guha, Dilan M. Gamachchi, Arash Ghobadi et al.
1 citations
Journal of Materials Chemistry C
Analytical Chemistry and Sensors
0.74
article

Engineered semiconductor-dielectric interfaces in polymer ferroelectric transistors

Andrew C. Meng, S. Guha, Dilan M. Gamachchi, Arash Ghobadi, Joseph Mathai, Indeewari M. Karunarathne, Shubhra Gangopadhyay, Thomas Kallaos
article en
1 citations

Abstract

A comparison of atomic layer deposited Al 2 O 3 on PVDF-based copolymers in polymer transistors shows a significant improvement in the subthreshold swing for PVDF-HFP devices compared with PVDF-TrFE. Al 2 O 3 passivates the interfacial traps.

Journal of Materials Chemistry CVol. 13(26)
University of Missouri (US)
National Science Foundation, Division of Electrical, Communications and Cyber Systems
Openalex Percentile: Top 32%
Analytical Chemistry and Sensors
0.74
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Engineered semiconductor-dielectric interfaces in polymer ferroelectric transistors — Andrew C. Meng, S. Guha, et al. · Journal of Materials Chemistry C (2025) | TGRS Research Map | TGRS