Mismatch and Retention Time Analysis of DRAMs Down to 4 K

Abstract This paper explores the retention time (RT) properties of dynamic random-access memory (DRAM) arrays at cryogenic temperatures (4 K). We provide an in-depth examination of leakage sources to elucidate RT behaviour across different temperatures, and we conduct a study on the mismatch between DRAM cells, highlighting various trade-offs, including cell area, mismatch, retention time, and power consumption. Our findings offer valuable insights for circuit designers working on large-scale quantum computing or superconducting nanowire single-photon detectors (SNSPDs) arrays, especially those aiming to store data at 4 K to avoid the wiring bottleneck associated with outputting each pixel from 4 K to room temperature for data analysis.

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Publication Details

Journal
IOP Conference Series Materials Science and Engineering
Published
2025-05-01
DOI
https://doi.org/10.1088/1757-899x/1327/1/012217
Primary Topic
Low-power high-performance VLSI design
Type
article
Field-Weighted Citation Impact
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article

Mismatch and Retention Time Analysis of DRAMs Down to 4 K

Edoardo Charbon, Jad Benserhir, Osman Kiziltug
IOP Conference Series Materials Science and Engineering
Low-power high-performance VLSI design
article

Mismatch and Retention Time Analysis of DRAMs Down to 4 K

Edoardo Charbon, Jad Benserhir, Osman Kiziltug
article en

Abstract

Abstract This paper explores the retention time (RT) properties of dynamic random-access memory (DRAM) arrays at cryogenic temperatures (4 K). We provide an in-depth examination of leakage sources to elucidate RT behaviour across different temperatures, and we conduct a study on the mismatch between DRAM cells, highlighting various trade-offs, including cell area, mismatch, retention time, and power consumption. Our findings offer valuable insights for circuit designers working on large-scale quantum computing or superconducting nanowire single-photon detectors (SNSPDs) arrays, especially those aiming to store data at 4 K to avoid the wiring bottleneck associated with outputting each pixel from 4 K to room temperature for data analysis.

IOP Conference Series Materials Science and EngineeringVol. 1327(1)
École Polytechnique Fédérale de Lausanne (CH)
Openalex Percentile: Top 62%
Low-power high-performance VLSI design
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Mismatch and Retention Time Analysis of DRAMs Down to 4 K — Edoardo Charbon, Jad Benserhir, et al. · IOP Conference Series Materials Science and Engineering (2025) | TGRS Research Map | TGRS