Graphene-Based FPGA Design and Optimization at the 7nm FinFET Technology Node
Emerging graphene-based interconnects exhibit excellent conductivity, rendering them a promising alternative to traditional interconnect materials. The energy consumption and delay of field-programmable gate arrays (FPGAs) are significantly influenced by global routing, which presents a compelling opportunity for graphene interconnect technology. This study examines the potential benefits of replacing copper (Cu), the conventional interconnect material, with graphene. Three interconnect technologies are examined: Cu interconnects, improved graphene-capped Cu interconnects, and thick graphene. An interconnect/system co-design framework is designed to systematically evaluate their performance differences. Concerning graphene material-level parameters, our focus is on the impact of graphene contact resistance and mean-free-path on performance. Benchmark simulations indicate that graphene-based interconnects can enhance the energy-delay product of circuits by up to 32% in comparison to conventional Cu interconnects at the 7nm FinFET technology node.
Authors
- Qilian Liang (ORCID: https://orcid.org/0000-0002-3630-8010)
- Chenyun Pan (ORCID: https://orcid.org/0000-0001-9161-1728)
- Liuting Shang (ORCID: https://orcid.org/0000-0001-8149-8696)
- Zhenlin Pei (ORCID: https://orcid.org/0000-0002-0926-2838)
- Sungyong Jung (ORCID: https://orcid.org/0000-0002-0749-0394)
- Sheng Lu (ORCID: https://orcid.org/0000-0002-5639-9845)
Institutions
- South Dakota State University (US)
- The University of Texas at Arlington (US)
Publication Details
- Published
- 2025-04-23
- DOI
- https://doi.org/10.1109/isqed65160.2025.11014392
- Citations
- 1
- Primary Topic
- Advancements in Semiconductor Devices and Circuit Design
- Type
- article
- Field-Weighted Citation Impact
- 0.73
Funders
- National Science Foundation