Modeling and Simulation of MCF Polishing Flow Characteristics for Deep Hole Inner Surface Based on Claw-Type Polishing Head

针对深孔内表面抛光均匀性难以控制的问题，基于磁流体的抛光技术提供了新思路。文章提出了一种由主磁铁与三个辅助磁铁协作的抛光头，通过旋转，带动磁性复合流体(MCF)抛光液在弯管内形成可控流场，实现内表面抛光。基于仿真平台，构建了包含抛光头运动、MCF流体动力学及深孔工件几何结构的耦合模型，通过定义磁场–流场–固体运动的多物理场边界条件，进行仿真分析。仿真结果表明，爪型抛光头可在深孔内产生均匀的磁场。通过分析壁面剪切应力分布，验证了爪型抛光头对MCF抛光液的驱动效率及深孔内表面抛光的均匀性。本研究为磁控流体抛光技术在深孔加工中的应用提供了理论依据，为抛光头结构优化与工艺参数调控奠定了基础。Aiming at the challenge of controlling the polishing uniformity of deep hole inner surfaces, polishing technology based on magnetorheological fluid offers a new solution. A polishing head composed of a main magnet and three auxiliary magnets is proposed. Through rotation, it drives the magnetic compound fluid (MCF) polishing liquid to form a controllable flow field within the elbow, enabling inner surface polishing. Based on a simulation platform, a coupled model integrating the polishing head’s motion, MCF fluid dynamics, and the geometric structure of deep-hole workpieces is established. By defining multi-physical field boundary conditions for magnetic field-flow field-solid motion, simulation analysis is conducted. Results show that the claw-type polishing head can generate a uniform magnetic field inside deep holes. Analyzing the wall shear stress distribution verifies the driving efficiency of the claw-type polishing head on MCF polishing liquid and the uniformity of deep hole inner surface polishing. This study provides a theoretical foundation for applying magnetorheological fluid polishing technology in deep-hole machining and lays the groundwork for optimizing polishing head structures and regulating process parameters.