Parametric Optimization of Verilog-A code for Double-PHL of RRAM Device in a Step-by-Step Approach

The requirement of precise mathematical modeling and corresponding Verilog-A implementation is pivotal for circuit designing of many applications, like, non-volatile memory, logic circuits, and neuromorphic computing, with memristor devices, possessing pinched hysteresis loop (PHL) in I-V characteristics. A few works were reported with single PHL behavior; but yet to correlate with multilevel PHL, as aligned with experimental reports. The present work focuses on the development of such a model by optimization in the parametric level in the Simmons model, well adopted to describe single PHL conventionally, step-by-step, alteration of parameters and comparison with experimental data is the key methodology of this work. Proposing threshold voltage, as a new parameter, is substantial for appreciable agreement for simultaneous matching of the double loop (PHL) case. The matching shows an appreciable error of ~7% for lower–voltage PHL and that of ~3% for higher-voltage PHL.

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Published
2025-04-05
DOI
https://doi.org/10.1109/devic63749.2025.11012324
Primary Topic
Advancements in Photolithography Techniques
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article
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article

Parametric Optimization of Verilog-A code for Double-PHL of RRAM Device in a Step-by-Step Approach

Sunil Prajapati, K. Dutta, Priyanka H. Tripathi
Advancements in Photolithography Techniques
article

Parametric Optimization of Verilog-A code for Double-PHL of RRAM Device in a Step-by-Step Approach

Sunil Prajapati, K. Dutta, Priyanka H. Tripathi
article en

Abstract

The requirement of precise mathematical modeling and corresponding Verilog-A implementation is pivotal for circuit designing of many applications, like, non-volatile memory, logic circuits, and neuromorphic computing, with memristor devices, possessing pinched hysteresis loop (PHL) in I-V characteristics. A few works were reported with single PHL behavior; but yet to correlate with multilevel PHL, as aligned with experimental reports. The present work focuses on the development of such a model by optimization in the parametric level in the Simmons model, well adopted to describe single PHL conventionally, step-by-step, alteration of parameters and comparison with experimental data is the key methodology of this work. Proposing threshold voltage, as a new parameter, is substantial for appreciable agreement for simultaneous matching of the double loop (PHL) case. The matching shows an appreciable error of ~7% for lower–voltage PHL and that of ~3% for higher-voltage PHL.

Indian Institute of Information Technology Design and Manufacturing Jabalpur (IN)
Openalex Percentile: Top 90%
Advancements in Photolithography Techniques
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