Low Leakage Current β-Ga₂O₃ Self-Aligned Trench Junction Barrier Schottky Diodes
We demonstrate the fabrication of β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> self-aligned trench junction barrier Schottky (TJBS) diodes with a high breakdown voltage (BV) and suppressed reverse leakage current, in which the micrometer-deep trenches were formed using the Schottky anode metal as an etching mask and subsequently covered by a layer of p-type nickel oxide (NiO). High BVs of over 2 kV were achieved in small area devices (0.43 × 0.43 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>) while maintaining an ultralow reverse leakage current density of around 10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-<roman>5</roman></sup> A/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup> until breakdown. A TCAD simulation analysis revealed that the deep trenches covered with p-NiO can effectively reduce the surface electric field of the proposed device and provide sufficient p-shielding effects. Additionally, the packaged large-area β-Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> TJBS diodes (3 × 3 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sup>) show a forward current <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">I</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>F</i></sub> and BV of 15 A/820 V. The results demonstrate that the self-aligned TJBS structure offers critical insights into reducing reverse leakage current and improving high current-handling capabilities in large-area devices.
Authors
- Huaxing Jiang (ORCID: https://orcid.org/0000-0003-1364-6196)
- Jun Liang (ORCID: https://orcid.org/0000-0001-8328-5168)
- Zhisheng Wu (ORCID: https://orcid.org/0000-0002-4004-9728)
- Haowen Luo
- Zimin Chen (ORCID: https://orcid.org/0000-0002-2051-7678)
- Xing Lü (ORCID: https://orcid.org/0000-0001-5808-9552)
- Tiecheng Luo
- Yanli Pei (ORCID: https://orcid.org/0000-0003-3456-0746)
- Huichao Hu
- Rui Zhou (ORCID: https://orcid.org/0000-0003-4069-2366)
- Gang Wang (ORCID: https://orcid.org/0000-0001-9110-3942)
- Shengliang Cheng
- Yuru Lai (ORCID: https://orcid.org/0009-0000-6058-1378)
Institutions
- Sun Yat-sen University (CN)
- Shenzhen Institute of Information Technology (CN)
- South China University of Technology (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-05-29
- DOI
- https://doi.org/10.1109/ted.2025.3571880
- Citations
- 5
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 2.14
Funders
- National Natural Science Foundation of China
- National Key Research and Development Program of China