Research on mitigating contamination of condensate polishing resin from octadecylamine lay-up protection of supercritical units
Abstract Octadecylamine (ODA) is an effective corrosion inhibitor during the lay-up periods of thermal power units. However, its application in supercritical and ultra-supercritical units has been limited due to the potential for contaminating the resin in condensate polishing treatment systems. This paper presents a retention control method based on the adsorption behavior of ODA on ion-exchange resins, effectively capturing residual ODA and thus reducing the risk of resin contamination. Experimental results show that this method can decrease residual ODA by over 95%, offering a practical solution for safely implementing ODA lay-up protection in supercritical units.
Authors
- Guang‐Hui Dong (ORCID: https://orcid.org/0000-0002-2578-3369)
- Liang Ma (ORCID: https://orcid.org/0000-0002-9636-118X)
- Shiyu Zhou
- Chunbo Zhang (ORCID: https://orcid.org/0000-0002-6125-2207)
- Jianxin Zhang (ORCID: https://orcid.org/0000-0001-6076-5433)
Institutions
- Jilin Electric Power Research Institute (China) (CN)
Publication Details
- Journal
- Journal of Physics Conference Series
- Published
- 2025-05-01
- DOI
- https://doi.org/10.1088/1742-6596/3018/1/012014
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- People's Government of Jilin Province