Research on mitigating contamination of condensate polishing resin from octadecylamine lay-up protection of supercritical units

Abstract Octadecylamine (ODA) is an effective corrosion inhibitor during the lay-up periods of thermal power units. However, its application in supercritical and ultra-supercritical units has been limited due to the potential for contaminating the resin in condensate polishing treatment systems. This paper presents a retention control method based on the adsorption behavior of ODA on ion-exchange resins, effectively capturing residual ODA and thus reducing the risk of resin contamination. Experimental results show that this method can decrease residual ODA by over 95%, offering a practical solution for safely implementing ODA lay-up protection in supercritical units.

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Publication Details

Journal
Journal of Physics Conference Series
Published
2025-05-01
DOI
https://doi.org/10.1088/1742-6596/3018/1/012014
Primary Topic
Advanced Surface Polishing Techniques
Type
article
Field-Weighted Citation Impact
0.00

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article

Research on mitigating contamination of condensate polishing resin from octadecylamine lay-up protection of supercritical units

Guang‐Hui Dong, Liang Ma, Shiyu Zhou, Chunbo Zhang et al.
Journal of Physics Conference Series
Advanced Surface Polishing Techniques
article

Research on mitigating contamination of condensate polishing resin from octadecylamine lay-up protection of supercritical units

Guang‐Hui Dong, Liang Ma, Shiyu Zhou, Chunbo Zhang, Jianxin Zhang
article en

Abstract

Abstract Octadecylamine (ODA) is an effective corrosion inhibitor during the lay-up periods of thermal power units. However, its application in supercritical and ultra-supercritical units has been limited due to the potential for contaminating the resin in condensate polishing treatment systems. This paper presents a retention control method based on the adsorption behavior of ODA on ion-exchange resins, effectively capturing residual ODA and thus reducing the risk of resin contamination. Experimental results show that this method can decrease residual ODA by over 95%, offering a practical solution for safely implementing ODA lay-up protection in supercritical units.

Journal of Physics Conference SeriesVol. 3018(1)
Jilin Electric Power Research Institute (China) (CN)
People's Government of Jilin Province
Openalex Percentile: Top 89%
Advanced Surface Polishing Techniques
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