Effects of Temperature Annealing on the Intrinsic Transport Mechanisms of Solution Processed Graphene Nanosheet Networks

Abstract 2D material inks have the potential to strongly impact printed electronics, offering exciting opportunities for flexible and wearable devices. However, their electrical performance is often hindered by the resistive nature of inter‐nanosheet junctions within randomly assembled nanosheet networks, limiting their efficiency compared to individual nanosheets. Overcoming this challenge necessitates a comprehensive understanding of the conduction mechanisms governing charge transport in these networks. In this study, a water‐based graphene ink is prepared via liquid‐phase exfoliation (LPE), deposited onto Si/SiO₂ substrates through inkjet printing, and electrically characterized over a wide temperature range (80–400 K) following thermal annealing at different temperatures. To interpret the temperature‐dependent conductivity, a Random Resistor Network (RRN) model is employed that accounts for spatial and energetic variability among nodes. With this approach low and high temperature transport regimes are effectively studied, identifying inter‐flake and intra‐flake hopping mechanisms and providing valuable insights into the factors governing charge transport. Using Monte Carlo simulations, the RRN model delivers statistically robust predictions while capturing temperature‐dependent transitions and annealing effects, achieving excellent agreement with experimental observations.

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Institutions

Publication Details

Journal
Advanced Functional Materials
Published
2025-05-28
DOI
https://doi.org/10.1002/adfm.202501534
Citations
5
Primary Topic
Graphene research and applications
Type
article
Field-Weighted Citation Impact
2.59

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article

Effects of Temperature Annealing on the Intrinsic Transport Mechanisms of Solution Processed Graphene Nanosheet Networks

Aniello Pelella, Enver Faella, M. Passacantando, Zixing Peng et al.
5 citations
Advanced Functional Materials
Graphene research and applications
2.59
article

Effects of Temperature Annealing on the Intrinsic Transport Mechanisms of Solution Processed Graphene Nanosheet Networks

Aniello Pelella, Enver Faella, M. Passacantando, Zixing Peng, Damiano Marian, Jing Jing Wang, Alessandro Grillo, Gianluca Fiori, Alejandro Toral-López, Antonio Di Bartolomeo
article en
5 citations

Abstract

Abstract 2D material inks have the potential to strongly impact printed electronics, offering exciting opportunities for flexible and wearable devices. However, their electrical performance is often hindered by the resistive nature of inter‐nanosheet junctions within randomly assembled nanosheet networks, limiting their efficiency compared to individual nanosheets. Overcoming this challenge necessitates a comprehensive understanding of the conduction mechanisms governing charge transport in these networks. In this study, a water‐based graphene ink is prepared via liquid‐phase exfoliation (LPE), deposited onto Si/SiO₂ substrates through inkjet printing, and electrically characterized over a wide temperature range (80–400 K) following thermal annealing at different temperatures. To interpret the temperature‐dependent conductivity, a Random Resistor Network (RRN) model is employed that accounts for spatial and energetic variability among nodes. With this approach low and high temperature transport regimes are effectively studied, identifying inter‐flake and intra‐flake hopping mechanisms and providing valuable insights into the factors governing charge transport. Using Monte Carlo simulations, the RRN model delivers statistically robust predictions while capturing temperature‐dependent transitions and annealing effects, achieving excellent agreement with experimental observations.

Advanced Functional MaterialsVol. 35(46)
University of Pisa (IT), University of Salerno (IT), University of L'Aquila (IT), University of Manchester (GB)
Dipartimenti di Eccellenza, Leverhulme Trust, Royal Society, European Commission, Ministero dell’Istruzione, dell’Università e della Ricerca, China Scholarship Council, National Physical Laboratory, HORIZON EUROPE European Research Council
Openalex Percentile: Top 10%
Graphene research and applications
2.59
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