Novel Complementary Field-Effect Transistors With Tree-Type Channel for 3-nm Technology Node
This article proposes a novel tree-type channel complementary field-effect transistor (Tree-CFET) featuring a channel composed of vertically stacked Si nanosheets (NSs) interconnected by SiGe fin-like interbridges (IBs). Under a unified off-state leakage current benchmark (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">I</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>off</roman></sub> = 5 nA), the proposed Tree-CFET provides a significantly higher effective channel width (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">W</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>eff</roman></sub>) compared to the NS CFET (NS-CFET), resulting in a substantial increase in on-state current (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">I</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>on</roman></sub>) for both NFET and PFET by 24.20% and 42.99%, along with enhancements in transconductance (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">gm</i>) by 41.14% and 61.76%, respectively. As an inverter, the Tree-CFET demonstrates significant improvements in propagation delay time (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>p</roman></sub>) compared to the NS-CFET. Specifically, the high-to-low <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>p</roman></sub> (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>pHL</roman></sub>) and low-to-high <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>p</roman></sub> (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>pLH</roman></sub>) are reduced by 2.41% and 23.71%, respectively, while exhibiting more symmetrical propagation delays. This article further investigates the effects of different IB heights (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">H</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>IB</roman></sub>), IB widths (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">W</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>IB</roman></sub>), and Ge concentrations in the SiGe IBs on Tree-CFET performance. These results demonstrate the potential of the Tree-CFET for enhanced performance in advanced technology nodes.
Authors
- Shaoqiang Chen (ORCID: https://orcid.org/0000-0002-0458-3894)
- Xinyu Zou (ORCID: https://orcid.org/0000-0002-4582-5992)
- Bingyi Ye (ORCID: https://orcid.org/0000-0002-7671-2800)
- Fei Lu (ORCID: https://orcid.org/0000-0002-0539-5887)
- Yabin Sun (ORCID: https://orcid.org/0000-0002-3783-2885)
- Xinyu Dong (ORCID: https://orcid.org/0000-0003-1996-6334)
- Jianing Zhao (ORCID: https://orcid.org/0000-0003-2059-2798)
- Yuhang Zhang (ORCID: https://orcid.org/0000-0003-1987-0703)
- Xiaojin Li (ORCID: https://orcid.org/0000-0002-9603-8489)
- Yanling Shi
- Yang Shen (ORCID: https://orcid.org/0000-0003-1446-292X)
Institutions
- Fudan University (CN)
- Shanghai Fudan Microelectronics (China) (CN)
- East China Normal University (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-05-28
- DOI
- https://doi.org/10.1109/ted.2025.3572032
- Citations
- 7
- Primary Topic
- Advancements in Semiconductor Devices and Circuit Design
- Type
- article
- Field-Weighted Citation Impact
- 5.11
Funders
- National Natural Science Foundation of China