Aluminum Boron Nitride Ferroelectric Field-Effect Transistors With ZnO Semiconductor Channel
The discovery of ferroelectricity in hafnium zirconium oxide (Hf<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>Zr<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>1</roman>-<i>x</i></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>) and related fluorite materials has spurred interest in ferroelectric devices suitable for integration with silicon integrated circuits (ICs), especially those that can be embedded in the back-end-of-line (BEOL) process. More recently, ferroelectricity has been found in wurtzite aluminum nitride-based materials, such as scandium and boron-doped aluminum nitride (Al<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>1</roman>-<i>x</i></sub>Sc<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>N and Al<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>1</roman>-<i>x</i></sub>B<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>x</i></sub>N). Although these materials currently have undesirably large coercive electric fields, and small breakdown electric field-to-coercive electric field ratio, their low processing temperatures and large remanent polarization offer intriguing possibilities for device applications. Here, we report ferroelectric field-effect transistors (FeFETs) with a 15 nm thick Al<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>0.88</roman></sub>B<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>0.12</roman></sub>N layer and an 11 nm ZnO semiconductor channel, achieving a memory window >1 V and switching voltages (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>switch</roman></sub>) <±10 V.
Authors
- Jon‐Paul Maria (ORCID: https://orcid.org/0000-0003-3604-4761)
- Quyen Tran
- Thomas N. Jackson (ORCID: https://orcid.org/0000-0003-2272-5830)
- Joseph Casamento (ORCID: https://orcid.org/0000-0002-8621-1145)
- John Hayden (ORCID: https://orcid.org/0000-0002-0055-0198)
Institutions
- Pennsylvania State University (US)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-05-28
- DOI
- https://doi.org/10.1109/ted.2025.3570279
- Primary Topic
- Acoustic Wave Resonator Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00