Control of iron doping during the growth of bulk gallium oxide crystals by the Czochralski method

In this work, bulk β-Ga2O3 crystals were grown by the Czochralski method and doped with iron with different amounts of dopants. The dependence of the crystalline quality on the Fe content was studied. Measurements of the specific resistance and optical transmission spectra confirmed the compensation of donors, the binding of conduction electrons, and the growth of the specific resistance with an increase in the iron content in the crystals up to 1.6 × 1011 Ω cm. The obtained value of the activation energy of the deep level of Fe was EA = 0.66 eV.

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Publication Details

Journal
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Published
2025-05-27
DOI
https://doi.org/10.1116/6.0004535
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.00

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article

Control of iron doping during the growth of bulk gallium oxide crystals by the Czochralski method

А. Е. Романов, B. Ya. Ber, P. V. Bogdanov, W. V. Lundin et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Ga2O3 and related materials
article

Control of iron doping during the growth of bulk gallium oxide crystals by the Czochralski method

А. Е. Романов, B. Ya. Ber, P. V. Bogdanov, W. V. Lundin, D.I. Panov, P. N. Brunkov, A. F. Tsatsul’nikov, D. Yu. Kazantsev, E. Yu. Lundina, V. A. Spiridonov, D. A. Bauman, A.Yu. Ivanov, M. V. Tokarev, S. S. Rachkov
article en

Abstract

In this work, bulk β-Ga2O3 crystals were grown by the Czochralski method and doped with iron with different amounts of dopants. The dependence of the crystalline quality on the Fe content was studied. Measurements of the specific resistance and optical transmission spectra confirmed the compensation of donors, the binding of conduction electrons, and the growth of the specific resistance with an increase in the iron content in the crystals up to 1.6 × 1011 Ω cm. The obtained value of the activation energy of the deep level of Fe was EA = 0.66 eV.

Journal of Vacuum Science & Technology A Vacuum Surfaces and FilmsVol. 43(4)
ITMO University (RU), Submicron Heterostructures for Microelectronics Research and Engineering Center (RU), Ioffe Institute (RU)
Russian Science Foundation
Openalex Percentile: Top 93%
Ga2O3 and related materials
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