OCD -Machine learning based metrology for copper pad surface for hybrid bonding integration

In the context of 3D hybrid bonding architectures, ensuring the flatness of metallic pads before bonding is critical. The control of this flatness is important and the dimension to be measured is very small (~nm) compared to the dimensions of the pattern (~µm). Traditional control methods, such as Atomic Force Microscopy (AFM), offer high precision but lack the throughput required for high-volume manufacturing. Spectroscopic reflectometry (SR) presents an attractive metrological method due to its speed and larger measurement coverage. This study investigates the sensitivity of SR to dishing of copper pad across wafers with different thicknesses. We evaluate the ability of using a Deep Neural Network (DNN) model trained on raw spectra to predict copper dishing, using AFM as the reference measurement. Additionally, we assess whether the model can be extended to new batches of wafers and capture process variations. This study examines the capabilities of the deep learning based-model robustness predict the dishing of copper pads across varying experimental conditions.

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Published
2025-05-05
DOI
https://doi.org/10.1109/asmc64512.2025.11010798
Primary Topic
3D IC and TSV technologies
Type
article
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article

OCD -Machine learning based metrology for copper pad surface for hybrid bonding integration

M. Besacier, Justine Grasland, Delphine Le Cunff, J.H. Tortai et al.
2 links
3D IC and TSV technologies
article

OCD -Machine learning based metrology for copper pad surface for hybrid bonding integration

M. Besacier, Justine Grasland, Delphine Le Cunff, J.H. Tortai, Alfred Q. R. Baron, Sébastien Mermoz, Robin Poirot, Nicolas Ranger
article en

Abstract

In the context of 3D hybrid bonding architectures, ensuring the flatness of metallic pads before bonding is critical. The control of this flatness is important and the dimension to be measured is very small (~nm) compared to the dimensions of the pattern (~µm). Traditional control methods, such as Atomic Force Microscopy (AFM), offer high precision but lack the throughput required for high-volume manufacturing. Spectroscopic reflectometry (SR) presents an attractive metrological method due to its speed and larger measurement coverage. This study investigates the sensitivity of SR to dishing of copper pad across wafers with different thicknesses. We evaluate the ability of using a Deep Neural Network (DNN) model trained on raw spectra to predict copper dishing, using AFM as the reference measurement. Additionally, we assess whether the model can be extended to new batches of wafers and capture process variations. This study examines the capabilities of the deep learning based-model robustness predict the dishing of copper pads across varying experimental conditions.

Institut polytechnique de Grenoble (FR), Centre National de la Recherche Scientifique (FR), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), CEA Grenoble (FR), STMicroelectronics (France) (FR), Laboratoire d'Électronique des Technologies de l'Information (FR), Université Grenoble Alpes (FR)
Openalex Percentile: Top 90%
3D IC and TSV technologies
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