Lifetime Extension for Oxide Etch Application with Silicon Carbide Focus Ring
This paper proposes the change of focus ring (FR) material from silicon (Si) to silicon carbide (SiC) to extend the lifetime of the oxide etch chamber. This is important because the lifetime extension has a significant impact on the cost of machine maintenance and machine uptime. This can potentially extend the lifetime of at least 30% more than the current lifetime.
Authors
- Kin Wai Tang
- Kai Tan (ORCID: https://orcid.org/0000-0001-9373-4705)
- F. Chai (ORCID: https://orcid.org/0009-0001-1731-1003)
- Vivian Wen Xin Siew
Institutions
- GlobalFoundries (Singapore) (SG)
Publication Details
- Published
- 2025-05-05
- DOI
- https://doi.org/10.1109/asmc64512.2025.11010710
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00