Recurring Hotspot Detection in Lithography

A recurring hotspots detection system has been implemented to highlight wafers with marginal hotspot below the Focus Spot Monitoring (FSM) threshold in the lithography process. The system plays a key role in early detection and reduces exposure to repeating hotspots that causes inline, sort, or electric test failure. Through image processing techniques and mathematical computations, the exposed wafers are highlighted in a monitoring chart and auto-disposition is triggered.