Interaction Study of DIW on Fluoride-Based Solvent Chemical Behaviour

This paper investigates the interaction between two key components of Fluoride-Based Solvent: Component A (Fluorine-based, denote as XF) and Deionized Water (DIW), which work in tandem to effectively remove dielectric and metallic polymer residues. However, an undesirable phenomenon observed with the Fluoride-Based Solvent is the excessive increase in metallic and dielectric film loss with usage. This was found to be linked to the depletion of DIW, which results in a more concentrated XF. This paper presents a detailed explanation of the chemical reactions involved in the process and explores potential factors impacting the polymer removal performance. A novel approach is introduced to regulate the DIW concentration through a DIW spiking system with real-time chemical assay analysis. A consistent removal rate performance is achieved, enabling chemical life extension and extended benefits such as improved uptime, cost and quality.