Atomic layer deposition of a thin TiO <sub>2</sub> layer on nickel-rich cathode NCM83 for improved cycling stability
Coating of a thin TiO 2 layer of about 3 nm thickness on NCM83 using the atomic layer deposition method effectively suppresses interfacial side reactions, mitigates phase transitions, and enhances cycling stability.
Authors
- Danyang Li (ORCID: https://orcid.org/0000-0001-5083-9638)
- Shu Zhao (ORCID: https://orcid.org/0000-0003-4377-1086)
- Chao Wang (ORCID: https://orcid.org/0000-0002-4674-4502)
- Haichao Chen (ORCID: https://orcid.org/0000-0001-5973-1498)
- Fujie Li (ORCID: https://orcid.org/0009-0008-2471-4047)
- Can Liu (ORCID: https://orcid.org/0000-0002-8955-6245)
- Guangfeng Zeng (ORCID: https://orcid.org/0009-0005-0285-3722)
- Xin Zhao (ORCID: https://orcid.org/0000-0002-1276-5858)
- Zhengwei Li (ORCID: https://orcid.org/0000-0003-1644-1006)
Institutions
- Qingdao University (CN)
Publication Details
- Journal
- Journal of Materials Chemistry A
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ta02510a
- Citations
- 2
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 1.46