Heterogeneous Capacitor‐less Two‐transistor Dynamic Random Access Memory Cell with Long Retention Time and High Sensing Current Supporting 5‐Bit Multilevel Operation
A heterogeneous capacitor‐less two‐transistor (2T0C) dynamic random access memory (DRAM) cell is fabricated, featuring a write transistor with an amorphous indium–gallium–zinc–oxide (a‐IGZO) channel and a read transistor with a single crystal silicon (Si) channel. These transistors are vertically integrated to achieve high integration density. A data retention time of over 4800 s is achieved due to the wide bandgap of a‐IGZO, and a high sensing current of over 166 μA μm −1 is achieved due to the high mobility of the Si. This high sensing current allows for a short read latency of 1.34 ns and 5‐bit multilevel cell operation, the highest reported for 2T0C DRAM cells.
Authors
- S.-W. Lee (ORCID: https://orcid.org/0000-0001-8383-4913)
- Cheol Seong Hwang (ORCID: https://orcid.org/0000-0002-6254-9758)
- Jinheon Choi
- Joon‐Kyu Han (ORCID: https://orcid.org/0000-0002-8736-9091)
- Yong-Hee Lee (ORCID: https://orcid.org/0009-0003-8078-9901)
- N. Ghenzi (ORCID: https://orcid.org/0000-0003-2861-2204)
Institutions
- Seoul National University (KR)
- Sogang University (KR)
Publication Details
- Journal
- physica status solidi (RRL) - Rapid Research Letters
- Published
- 2025-05-25
- DOI
- https://doi.org/10.1002/pssr.202500131
- Citations
- 4
- Primary Topic
- Advanced Memory and Neural Computing
- Type
- article
- Field-Weighted Citation Impact
- 2.92
Funders
- National Research Foundation
- National Research Foundation of Korea
- Ministry of Science and ICT, South Korea
- Institute for Information and Communications Technology Promotion