C‐band All III‐Arsenide InAs Quantum Dot Lasers on InP Using Low Indium Composition Partial Capping

ABSTRACT This study demonstrates the growth of InAs quantum dots (QDs) on InP substrates using an all group III‐arsenide approach in molecular beam epitaxy (MBE) with a low‐indium‐composition InAlGaAs partial capping layer. Real‐time curvature measurements confirm effective strain compensation during multilayer QD growth, enabling precise control of emission wavelength and structural stability. The fabricated lasers exhibited successful operation at a telecommunication C‐band.

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Publication Details

Journal
Electronics Letters
Published
2025-01-01
DOI
https://doi.org/10.1049/ell2.70308
Citations
1
Primary Topic
Semiconductor Quantum Structures and Devices
Type
article
Field-Weighted Citation Impact
1.25

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article

C‐band All III‐Arsenide InAs Quantum Dot Lasers on InP Using Low Indium Composition Partial Capping

Yasuhiko Arakawa, Jihye Jung, Masahiro Kakuda, Jinkwan Kwoen
1 citations
Electronics Letters
Semiconductor Quantum Structures and Devices
1.25
article

C‐band All III‐Arsenide InAs Quantum Dot Lasers on InP Using Low Indium Composition Partial Capping

Yasuhiko Arakawa, Jihye Jung, Masahiro Kakuda, Jinkwan Kwoen
article en
1 citations

Abstract

ABSTRACT This study demonstrates the growth of InAs quantum dots (QDs) on InP substrates using an all group III‐arsenide approach in molecular beam epitaxy (MBE) with a low‐indium‐composition InAlGaAs partial capping layer. Real‐time curvature measurements confirm effective strain compensation during multilayer QD growth, enabling precise control of emission wavelength and structural stability. The fabricated lasers exhibited successful operation at a telecommunication C‐band.

Electronics LettersVol. 61(1)
The University of Tokyo (JP)
New Energy and Industrial Technology Development Organization, Japan Society for the Promotion of Science, Japan Science and Technology Agency, Moonshot Research and Development Program
Openalex Percentile: Top 21%
Semiconductor Quantum Structures and Devices
1.25
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