Application of Due Process in Disciplinary Administrative Procedures for Prosecutorial Personnel in the Judicial District of Huancavelica, 2017–2018
This study examines the relationship between due process compliance and the outcomes of disciplinary administrative procedures involving fiscal personnel in the Judicial District of Huancavelica between 2017 and 2018. Using a correlational-explanatory design, data were collected from 74 disciplinary files and analyzed to determine the impact of due process adherence on case outcomes. Descriptive statistics showed that the mean due process compliance was 63.5%, with significant variability across cases. A Spearman Rho correlation of 0.648 (p = 0.00) indicated a strong and statistically significant relationship between due process application and favorable outcomes. Additionally, logistic regression analysis revealed that full compliance (81-100%) increased the likelihood of favorable outcomes by 3.42 times (p = 0.001), while partial compliance also had a positive but smaller effect. The ANOVA results (F = 12.67, p = 0.000) confirmed significant differences in compliance levels across different outcomes, with full compliance showing a substantial impact on achieving favorable results. The study highlights the critical role of procedural fairness in administrative law, demonstrating that higher levels of due process compliance significantly improve the chances of positive outcomes for defendants. These findings underscore the need for stronger oversight and more consistent application of due process in disciplinary procedures.
Authors
- Ángel Alberto Chávez-Rodríguez
- Joel Jesús Bastidas-Valdivia
- Sheyla Arostegui-Peralta
- Yésica Solano-Lozano
Institutions
- Ministerio de Educación del Perú (PE)
- Universidad Nacional de Huancavelica (PE)
- Universidad Continental (PE)
Publication Details
- Journal
- Journal of Posthumanism
- Published
- 2025-05-22
- DOI
- https://doi.org/10.63332/joph.v5i6.2014
- Primary Topic
- Legal processes and jurisprudence
- Type
- article
- Field-Weighted Citation Impact
- 0.00