Defects Induced by High-Temperature Neutron Irradiation in 250 µm-Thick 4H-SiC p-n Junction Detector
The objective of the proposed work was to investigate the electrical performance of a 250 µm-thick 4H-SiC p-n junction detector after irradiation with DT neutrons (14.1 MeV energy) at high temperature (500 °C). The results showed that the current-voltage (I-V) characteristics of the unirradiated SiC detector were ideal, with an ideality factor close to 1.5. A high electron mobility (µ<sub>n</sub>) and built-in voltage (V<sub>bi</sub>) were also observed. Additionally, the leakage current remained very low in the temperature range of 298-523 K. High-temperature irradiation caused a deviation from ideal behaviour, leading to an increase in the ideality factor, decreases in the µ<sub>n</sub> and V<sub>bi</sub> values, and a significant rise in the leakage current. Studying the capacitance-voltage (C-V) characteristics, it was observed that neutron irradiation induced reductions in both Al-doped (p<sup>+</sup>-type) and N-doped (n<sup>-</sup>-type) 4H-SiC carrier concentrations. A comprehensive investigation of the deep defect states and impurities was carried out using deep-level transient spectroscopy (DLTS) in the temperature range of 85-750 K. In particular, high-temperature neutron irradiation influenced the behaviours of both the Z<sub>1/2</sub> and EH<sub>6/7</sub> traps, which were related to carbon interstitials, silicon vacancies, or anti-site pairs.
Authors
- Francesco La Via (ORCID: https://orcid.org/0000-0002-6842-581X)
- M.H. Kushoro (ORCID: https://orcid.org/0000-0002-2859-8345)
- S. De Luca
- Enrico Sangregorio (ORCID: https://orcid.org/0000-0003-0044-5889)
- Eleonora Quadrivi
- A. Muoio (ORCID: https://orcid.org/0000-0003-0837-187X)
- L. Calcagno (ORCID: https://orcid.org/0000-0003-0403-6708)
- Antonio Trotta (ORCID: https://orcid.org/0009-0007-2332-1316)
- Erik Gallo (ORCID: https://orcid.org/0009-0007-8554-9869)
- Alfio Samuele Mancuso (ORCID: https://orcid.org/0009-0009-1912-9959)
- Silvia Vanellone (ORCID: https://orcid.org/0000-0002-2965-6930)
Institutions
- Eni (Italy) (IT)
- University of Catania (IT)
- Institute for the Science and Technology of Plasmas (IT)
- National Research Council (IT)
- Institute for Microelectronics and Microsystems (IT)
- University of Milano-Bicocca (IT)
Publication Details
- Journal
- Materials
- Published
- 2025-05-22
- DOI
- https://doi.org/10.3390/ma18112413
- Citations
- 4
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 2.92
Funders
- European Commission