Optimized Flux-Less Bonding Process for High Throughput Using Simplified Equipment
We demonstrated flux-less TCB with a simplified process. This process involves a pre-treatment with a safe weak acid to remove metal oxides and the addition of basic functionalities to the bonder equipment. As a result, it enables a simplified equipment configuration compared to conventional flux-less TCB methods that involve hazardous materials. Furthermore, we optimized the newly adopted techniques for flux-less bonding for high throughput.
Authors
- Katsumi Terada
- Chih‐Ling Huang (ORCID: https://orcid.org/0000-0002-7323-4954)
- Toyoharu Terada
- Jun Mizuno
- Kentaro Mihara
- T. M. Hare
- Yu-Shi Lo
- Takayuki Miyoshi
Institutions
- Toray Industries, Inc. (Japan) (JP)
- National Cheng Kung University (TW)
Publication Details
- Published
- 2025-04-15
- DOI
- https://doi.org/10.23919/icep-iaac64884.2025.11003023
- Citations
- 1
- Primary Topic
- 3D IC and TSV technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.73