Optimized Flux-Less Bonding Process for High Throughput Using Simplified Equipment

We demonstrated flux-less TCB with a simplified process. This process involves a pre-treatment with a safe weak acid to remove metal oxides and the addition of basic functionalities to the bonder equipment. As a result, it enables a simplified equipment configuration compared to conventional flux-less TCB methods that involve hazardous materials. Furthermore, we optimized the newly adopted techniques for flux-less bonding for high throughput.

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Publication Details

Published
2025-04-15
DOI
https://doi.org/10.23919/icep-iaac64884.2025.11003023
Citations
1
Primary Topic
3D IC and TSV technologies
Type
article
Field-Weighted Citation Impact
0.73
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Optimized Flux-Less Bonding Process for High Throughput Using Simplified Equipment

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3D IC and TSV technologies
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article

Optimized Flux-Less Bonding Process for High Throughput Using Simplified Equipment

Katsumi Terada, Chih‐Ling Huang, Toyoharu Terada, Jun Mizuno, Kentaro Mihara, T. M. Hare, Yu-Shi Lo, Takayuki Miyoshi
article en
1 citations

Abstract

We demonstrated flux-less TCB with a simplified process. This process involves a pre-treatment with a safe weak acid to remove metal oxides and the addition of basic functionalities to the bonder equipment. As a result, it enables a simplified equipment configuration compared to conventional flux-less TCB methods that involve hazardous materials. Furthermore, we optimized the newly adopted techniques for flux-less bonding for high throughput.

Toray Industries, Inc. (Japan) (JP), National Cheng Kung University (TW)
Affordable and clean energy
Openalex Percentile: Top 28%
3D IC and TSV technologies
0.73
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