Overcoming Challenges in Colloidal and Chemical Stability of Graphene Oxide with Exploration of Dispersing Solvent

Graphene oxide (GO) offers immense potential across various applications, but its chemical and dispersion instabilities remain critical challenges. In this study, the role of solvent selection is investigated in enhancing the dispersion and chemical stability of GO after ripening. Through comprehensive characterization techniques, including rheology, SAXS, DLS, and SEM, it is demonstrated that solvents such as N-Methyl-2-Pyrrolidinone (NMP), dimethylformamide (DMF), and dimethyl sulfoxide (DMSO) effectively maintain the colloidal stability of GO by mitigating gelation and flocculation, attributed to their favorable interactions with the graphitic domains. Notably, ethylene glycol (EG) exhibited superior chemical stability by inhibiting the diffusion of functional groups and preventing reduction even at elevated temperatures (up to 145 °C). The findings emphasize the influence of solvent selection on GO's microstructure, rheological properties, and thermal stability during ripening, thereby contributing to enhancing the longevity of GO-based materials.

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Publication Details

Journal
Small
Published
2025-05-19
DOI
https://doi.org/10.1002/smll.202502991
Citations
1
Primary Topic
Graphene and Nanomaterials Applications
Type
article
Field-Weighted Citation Impact
0.67

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article

Overcoming Challenges in Colloidal and Chemical Stability of Graphene Oxide with Exploration of Dispersing Solvent

Geon Woong Kim, So Youn Kim
1 citations
Small
Graphene and Nanomaterials Applications
0.67
article

Overcoming Challenges in Colloidal and Chemical Stability of Graphene Oxide with Exploration of Dispersing Solvent

Geon Woong Kim, So Youn Kim
article en
1 citations

Abstract

Graphene oxide (GO) offers immense potential across various applications, but its chemical and dispersion instabilities remain critical challenges. In this study, the role of solvent selection is investigated in enhancing the dispersion and chemical stability of GO after ripening. Through comprehensive characterization techniques, including rheology, SAXS, DLS, and SEM, it is demonstrated that solvents such as N-Methyl-2-Pyrrolidinone (NMP), dimethylformamide (DMF), and dimethyl sulfoxide (DMSO) effectively maintain the colloidal stability of GO by mitigating gelation and flocculation, attributed to their favorable interactions with the graphitic domains. Notably, ethylene glycol (EG) exhibited superior chemical stability by inhibiting the diffusion of functional groups and preventing reduction even at elevated temperatures (up to 145 °C). The findings emphasize the influence of solvent selection on GO's microstructure, rheological properties, and thermal stability during ripening, thereby contributing to enhancing the longevity of GO-based materials.

SmallVol. 21(29)
Seoul National University (KR)
National Research Foundation, National Research Foundation of Korea, Ministry of Science and ICT, South Korea
Openalex Percentile: Top 32%
Graphene and Nanomaterials Applications
0.67
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