A K-Band Alternating Coupled Filter Based on Multi-Layer Electroforming Technology

To meet the requirement of communication industry for high-performance narrowband filters, we design a copper-based micro-coaxial structure for a K-band capacitive gap and parallel inductance alternating coupled narrowband filter. The filter has a passband center frequency of 22.50 GHz and a relative bandwidth of 4.4% The return loss is greater than 15 dB in the 22.0-23.0 GHz range, with an optimal insertion loss of 3.39 dB. Comparing with other filters with the same frequency, the designed filter achieves a narrower bandwidth and maintains lower insertion loss within the passband simultaneously, while ensuring miniaturization of the overall structure, offering an effective micro-coaxial solution for integrated communication systems.

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Publication Details

Published
2024-11-21
DOI
https://doi.org/10.1109/aisomt64170.2024.10992067
Primary Topic
Metal Forming Simulation Techniques
Type
article
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A K-Band Alternating Coupled Filter Based on Multi-Layer Electroforming Technology

Shengying Zou, Yuedong Xu, Peng Jin, Xuyao Zhang et al.
Metal Forming Simulation Techniques
article

A K-Band Alternating Coupled Filter Based on Multi-Layer Electroforming Technology

Shengying Zou, Yuedong Xu, Peng Jin, Xuyao Zhang, Jie Lin, Jian Ma
article en

Abstract

To meet the requirement of communication industry for high-performance narrowband filters, we design a copper-based micro-coaxial structure for a K-band capacitive gap and parallel inductance alternating coupled narrowband filter. The filter has a passband center frequency of 22.50 GHz and a relative bandwidth of 4.4% The return loss is greater than 15 dB in the 22.0-23.0 GHz range, with an optimal insertion loss of 3.39 dB. Comparing with other filters with the same frequency, the designed filter achieves a narrower bandwidth and maintains lower insertion loss within the passband simultaneously, while ensuring miniaturization of the overall structure, offering an effective micro-coaxial solution for integrated communication systems.

Harbin Institute of Technology (CN)
Affordable and clean energy
Openalex Percentile: Top 71%
Metal Forming Simulation Techniques
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