First-principles study of $$\hbox {SiO}_2$$/$$\hbox {MoS}_2$$ and $$\hbox {SiO}_2$$/$$\hbox {WS}_2$$ interfaces: A comparative analysis of surface terminations, van der Waals corrections, and functionals

Abstract This study presents a first-principles investigation of $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {MoS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>MoS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> and $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {WS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>WS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> interfaces, examining how surface terminations, van der Waals (vdW) corrections, and functional choices impact structural stability and electronic properties. Using density functional theory with generalized gradient approximation (GGA; PBE, PBEsol, revPBE), meta-GGA (SCAN, $$\hbox {r}^2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msup> <mml:mtext>r</mml:mtext> <mml:mn>2</mml:mn> </mml:msup> </mml:math> SCAN), and hybrid (PBE0) functionals, we assess the effect of vdW correction schemes (D2, D3, Tkatchenko-Scheffler) on interfacial energetics and separation. The results show that vdW corrections are essential for accurate GGA descriptions, while meta-GGAs yield similar accuracy even without them, enabling efficient modeling of $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> /2D heterostructures. Additionally, $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> surface morphology plays a significant role, with fully saturated interfaces showing lower energy and greater interlayer separations. In both $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {MoS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>MoS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> and $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {WS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>WS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> systems, band gap predictions using PBE0 closely match the experimental values, underscoring the value of hybrid functionals for accurate electronic structure calculations. Graphic Abstract

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Journal
MRS Advances
Published
2025-05-19
DOI
https://doi.org/10.1557/s43580-025-01287-8
Primary Topic
Electronic and Structural Properties of Oxides
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article
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article

First-principles study of $$\hbox {SiO}_2$$/$$\hbox {MoS}_2$$ and $$\hbox {SiO}_2$$/$$\hbox {WS}_2$$ interfaces: A comparative analysis of surface terminations, van der Waals corrections, and functionals

Mantao Huang, Vasileios Fotopoulos, Longlong Xu, Matthäus Siebenhofer et al.
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MRS Advances
Electronic and Structural Properties of Oxides
article

First-principles study of $$\hbox {SiO}_2$$/$$\hbox {MoS}_2$$ and $$\hbox {SiO}_2$$/$$\hbox {WS}_2$$ interfaces: A comparative analysis of surface terminations, van der Waals corrections, and functionals

Mantao Huang, Vasileios Fotopoulos, Longlong Xu, Matthäus Siebenhofer, Bilge Yildiz
article en

Abstract

Abstract This study presents a first-principles investigation of $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {MoS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>MoS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> and $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {WS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>WS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> interfaces, examining how surface terminations, van der Waals (vdW) corrections, and functional choices impact structural stability and electronic properties. Using density functional theory with generalized gradient approximation (GGA; PBE, PBEsol, revPBE), meta-GGA (SCAN, $$\hbox {r}^2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msup> <mml:mtext>r</mml:mtext> <mml:mn>2</mml:mn> </mml:msup> </mml:math> SCAN), and hybrid (PBE0) functionals, we assess the effect of vdW correction schemes (D2, D3, Tkatchenko-Scheffler) on interfacial energetics and separation. The results show that vdW corrections are essential for accurate GGA descriptions, while meta-GGAs yield similar accuracy even without them, enabling efficient modeling of $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> /2D heterostructures. Additionally, $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> surface morphology plays a significant role, with fully saturated interfaces showing lower energy and greater interlayer separations. In both $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {MoS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>MoS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> and $$\hbox {SiO}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>SiO</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> / $$\hbox {WS}_2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mtext>WS</mml:mtext> <mml:mn>2</mml:mn> </mml:msub> </mml:math> systems, band gap predictions using PBE0 closely match the experimental values, underscoring the value of hybrid functionals for accurate electronic structure calculations. Graphic Abstract

MRS AdvancesVol. 10(10)
Massachusetts Institute of Technology (US)
Semiconductor Research Corporation, Massachusetts Institute of Technology, Division of Materials Research
Openalex Percentile: Top 93%
Electronic and Structural Properties of Oxides
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