Graphene/h‐BN/ReS<sub>2</sub> Heterostructure Operating in Fowler−Nordheim Tunneling Regime for Polarization‐Sensitive Fast Photodetector

Abstract On‐chip polarization photodetectors are crucial for advancing optical communication, which is facing the challenges of limited polarization sensitivity and hard on‐chip integration. 2D materials offer unique opportunities for creating high‐performance polarization photodetectors thanks to their intrinsic anisotropy and extensive heterostructure design freedom. Herein, a graphene/h‐BN/ReS 2 tunneling heterostructure is designed to realize a high‐performance polarization photodetector in the Fowler−Nordheim tunneling (FNT) regime. Specifically, the photodetector achieves a high photocurrent signal‐to‐noise ratio of ≈10 3 by suppressing the tunneling dark current with the hBN tunneling layer. The h‐BN also creates a strong electric field, which accelerates the photogenerated carriers and achieves a response time of ≈70 µs. Such a high signal‐to‐noise ratio and short response time are over two orders of magnitude stronger and shorter than those of field‐effect transistor‐type ReS 2 photodetectors. Moreover, in the FNT regime, the contribution of an anisotropic tunneling barrier and effective hole mass can effectively enhance the photocurrent dichroic ratio to exceed the intrinsic absorption dichroic ratio of 1.61, achieving the maximal value of 1.85. The enhancement mechanism is well understood by the consistent experimental and theoretical results. This study provides a viable approach to designing high‐performance on‐chip polarization photodetectors by utilizing the characteristics of the FNT regime.

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Publication Details

Journal
Advanced Electronic Materials
Published
2025-05-14
DOI
https://doi.org/10.1002/aelm.202500001
Citations
3
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
1.55

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article

Graphene/h‐BN/ReS2 Heterostructure Operating in Fowler−Nordheim Tunneling Regime for Polarization‐Sensitive Fast Photodetector

Qingyu Yan, Xiang Chen, Li Hua Gao, Weigao Xu et al.
3 citations
Advanced Electronic Materials
2D Materials and Applications
1.55
article

Graphene/h‐BN/ReS2 Heterostructure Operating in Fowler−Nordheim Tunneling Regime for Polarization‐Sensitive Fast Photodetector

Qingyu Yan, Xiang Chen, Li Hua Gao, Weigao Xu, Takashi Taniguchi, Yuqing Huang, Kenji Watanabe, Ming Yang, Xinran Wang, Jingyao Wang, Xue Liu, Tianyi Zhou, Zehua Hu
article en
3 citations

Abstract

Abstract On‐chip polarization photodetectors are crucial for advancing optical communication, which is facing the challenges of limited polarization sensitivity and hard on‐chip integration. 2D materials offer unique opportunities for creating high‐performance polarization photodetectors thanks to their intrinsic anisotropy and extensive heterostructure design freedom. Herein, a graphene/h‐BN/ReS 2 tunneling heterostructure is designed to realize a high‐performance polarization photodetector in the Fowler−Nordheim tunneling (FNT) regime. Specifically, the photodetector achieves a high photocurrent signal‐to‐noise ratio of ≈10 3 by suppressing the tunneling dark current with the hBN tunneling layer. The h‐BN also creates a strong electric field, which accelerates the photogenerated carriers and achieves a response time of ≈70 µs. Such a high signal‐to‐noise ratio and short response time are over two orders of magnitude stronger and shorter than those of field‐effect transistor‐type ReS 2 photodetectors. Moreover, in the FNT regime, the contribution of an anisotropic tunneling barrier and effective hole mass can effectively enhance the photocurrent dichroic ratio to exceed the intrinsic absorption dichroic ratio of 1.61, achieving the maximal value of 1.85. The enhancement mechanism is well understood by the consistent experimental and theoretical results. This study provides a viable approach to designing high‐performance on‐chip polarization photodetectors by utilizing the characteristics of the FNT regime.

Advanced Electronic MaterialsVol. 11(12)
Anhui University (CN), University of Electronic Science and Technology of China (CN), Chinese Academy of Sciences (CN), National Institute for Materials Science (JP), Hefei Institutes of Physical Science (CN), Nanjing University of Posts and Telecommunications (CN), Suzhou Research Institute (CN), Collaborative Innovation Center of Advanced Microstructures (CN), Institute of Semiconductors (CN), Civil Aviation Flight University of China (CN), Nanjing University (CN), Tsinghua University (CN)
National Natural Science Foundation of China, Government of Jiangsu Province, Jiangsu Provincial Key Research and Development Program, National Key Research and Development Program of China
Peace, Justice and strong institutions
Openalex Percentile: Top 18%
2D Materials and Applications
1.55
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