Field-enhanced chemical vapor deposition: new perspectives for thin film growth
Chemical vapor deposition (CVD) is a versatile technique for producing thin films and coatings of functional materials with diverse mechanical, electrochemical, electrical, tribological, and optical properties.
Authors
- Sanjay Mathur (ORCID: https://orcid.org/0000-0003-2765-2693)
- Bhupendra Singh (ORCID: https://orcid.org/0000-0002-8705-2959)
- Thomas Fischer (ORCID: https://orcid.org/0000-0002-8363-9613)
Institutions
- University of Cologne (DE)
- Indian Institute of Technology Madras (IN)
Publication Details
- Journal
- Journal of Materials Chemistry A
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ta01081k
- Citations
- 13
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 9.50
Funders
- Deutsche Forschungsgemeinschaft
- Universität zu Köln