Reliability Impacts of Tapered Nanosheets and Localized Layout Effects in MBCFETs Fabricated with 2NM Logic Technology Featuring GAA
In this paper, we report on the reliability impacts of tapered-nanosheets (NSs) and metal-gate-boundary (MGB) localized layout effects (LLE) in Multi-Bridge-Channel field effect transistors (MBCFETs) fabricated using 2nm gate-allaround (GAA) logic technology. We subjected T-shaped, dumbbell-shaped (D-shape), and stair-shaped (S-shape) structures to bias temperature instability (BTI) tests. Unique transitions in tapered NSs alter the source/drain (SD) volume, leading to stress changes in the channel. N-type transistors (SGN) positive BTI (PBTI) threshold voltage (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}}}$</tex>) shifts are primarily influenced by initial threshold voltage (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}0}}$</tex>), while P-type transistors (SGP) negative BTI (NBTI) <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}}}$</tex> shifts are affected by both of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}0}}$</tex> and stress induced hole trap barrier changes. Additionally, SGP NBTI <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}}}$</tex> shifts exhibit different behaviors depending on the width ratio. The BTI behavior in fall-type and rise-type S-shaped structures is similar to that in T-shaped and D-shaped structures. BTI <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}}}$</tex> shifts by MGB distance are influenced by oxygen vacancy exchange-induced <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}0}}$</tex> shifts. Furthermore, BTI <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}}}$</tex> shifts due to neighboring <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${{\mathrm{V}}_{\mathrm{t}}}$</tex> options are modified by dipole formation.
Authors
- Myung Soo Yeo
- Seongkyung Kim
- Jun-Kyo Jeong
- Taiki Uemura
- Jin Young Kim (ORCID: https://orcid.org/0000-0002-6595-4468)
- Jong-Ho Lee (ORCID: https://orcid.org/0000-0002-8843-545X)
- Jihun Ryu (ORCID: https://orcid.org/0000-0002-3101-7134)
- Shinyoung Chung
- Eunyu Choi
Institutions
- Samsung (South Korea) (KR)
Publication Details
- Published
- 2025-03-30
- DOI
- https://doi.org/10.1109/irps48204.2025.10983367
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00