Novel Trigger Circuit & SCR Device Co-Engineering Based Local (I/O-VSS & I/O-VDD) ESD Clamp Concepts with Improved Latch-Up Susceptibility, Lower Leakage and Lower Capacitance for Ultra High Speed I/Os

In this work, a novel silicon-controlled rectifier (SCR) based local protection concept is presented with co-engineered device and trigger circuit. This results in improved latch-up robustness, lower PAD capacitive loading and lower leakage when compared to the reference (state-of-the-art till date) concept. The proposed and reference concepts are realized in Samsung 28nm process for experimental validation and benchmarking. Its TLP/vf-TLP characteristics and other ESD measurement results along with the design trade-offs are presented and compared with the reference concept. A TCAD based device and circuit co-optimization (DTCO) methodology is also presented. The proposed concept can realize the demanding I/O needs of SCR based local clamps, qualified for HBM to CDM time domains, and meeting ESD specs required for high speed I/O buffers.

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Publication Details

Published
2025-03-30
DOI
https://doi.org/10.1109/irps48204.2025.10983375
Citations
2
Primary Topic
Electrostatic Discharge in Electronics
Type
article
Field-Weighted Citation Impact
1.46
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article

Novel Trigger Circuit & SCR Device Co-Engineering Based Local (I/O-VSS & I/O-VDD) ESD Clamp Concepts with Improved Latch-Up Susceptibility, Lower Leakage and Lower Capacitance for Ultra High Speed I/Os

Harihar Nath, Mayank Shrivastava, Mitesh Goyal, Mukesh Chaturvedi et al.
2 citations
Electrostatic Discharge in Electronics
1.46
article

Novel Trigger Circuit & SCR Device Co-Engineering Based Local (I/O-VSS & I/O-VDD) ESD Clamp Concepts with Improved Latch-Up Susceptibility, Lower Leakage and Lower Capacitance for Ultra High Speed I/Os

Harihar Nath, Mayank Shrivastava, Mitesh Goyal, Mukesh Chaturvedi, Mahesh Vaidya
article en
2 citations

Abstract

In this work, a novel silicon-controlled rectifier (SCR) based local protection concept is presented with co-engineered device and trigger circuit. This results in improved latch-up robustness, lower PAD capacitive loading and lower leakage when compared to the reference (state-of-the-art till date) concept. The proposed and reference concepts are realized in Samsung 28nm process for experimental validation and benchmarking. Its TLP/vf-TLP characteristics and other ESD measurement results along with the design trade-offs are presented and compared with the reference concept. A TCAD based device and circuit co-optimization (DTCO) methodology is also presented. The proposed concept can realize the demanding I/O needs of SCR based local clamps, qualified for HBM to CDM time domains, and meeting ESD specs required for high speed I/O buffers.

Samsung (India) (IN), Indian Institute of Science Bangalore (IN)
Affordable and clean energy
Openalex Percentile: Top 18%
Electrostatic Discharge in Electronics
1.46
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