Dielectric Breakdown Analysis on Bottom and Top-Gated IGZO-TFT

Reliability in IGZO thin-film transistors (TFT) is known to be limited by Bias Temperature Instability (BTI), however there are no detailed studies on other reliability mechanisms, like dielectric breakdown. We study both bottom-gated and top-gated transistors and find different area scaling trends in those devices, which could be partially explained with a non-uniform voltage distribution across the active area during the voltage accelerated breakdown stress. Both bottom and top-gated TFT obtain a maximum tolerable voltage of more than 2 V at 95°C for 10 years. Even for the smallest measured device, 80x25 nm2, breakdown is not a reliability concern.

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Published
2025-03-30
DOI
https://doi.org/10.1109/irps48204.2025.10983521
Primary Topic
Thin-Film Transistor Technologies
Type
article
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Dielectric Breakdown Analysis on Bottom and Top-Gated IGZO-TFT

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Thin-Film Transistor Technologies
article

Dielectric Breakdown Analysis on Bottom and Top-Gated IGZO-TFT

S. Van Beek, Subhali Subhechha, Hongwei Tang, João P. A. Bastos, Yiqun Wan, H.A. Deckers, Attilio Belmonte, Adrian Chasin, Nouredine Rassoul, Gouri Sankar Kar
article en

Abstract

Reliability in IGZO thin-film transistors (TFT) is known to be limited by Bias Temperature Instability (BTI), however there are no detailed studies on other reliability mechanisms, like dielectric breakdown. We study both bottom-gated and top-gated transistors and find different area scaling trends in those devices, which could be partially explained with a non-uniform voltage distribution across the active area during the voltage accelerated breakdown stress. Both bottom and top-gated TFT obtain a maximum tolerable voltage of more than 2 V at 95°C for 10 years. Even for the smallest measured device, 80x25 nm2, breakdown is not a reliability concern.

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