Dielectric Breakdown Analysis on Bottom and Top-Gated IGZO-TFT
Reliability in IGZO thin-film transistors (TFT) is known to be limited by Bias Temperature Instability (BTI), however there are no detailed studies on other reliability mechanisms, like dielectric breakdown. We study both bottom-gated and top-gated transistors and find different area scaling trends in those devices, which could be partially explained with a non-uniform voltage distribution across the active area during the voltage accelerated breakdown stress. Both bottom and top-gated TFT obtain a maximum tolerable voltage of more than 2 V at 95°C for 10 years. Even for the smallest measured device, 80x25 nm2, breakdown is not a reliability concern.
Authors
- S. Van Beek (ORCID: https://orcid.org/0000-0002-2499-4172)
- Subhali Subhechha (ORCID: https://orcid.org/0000-0002-1960-5136)
- Hongwei Tang (ORCID: https://orcid.org/0009-0005-1345-5551)
- João P. A. Bastos (ORCID: https://orcid.org/0000-0002-8877-9850)
- Yiqun Wan
- H.A. Deckers
- Attilio Belmonte (ORCID: https://orcid.org/0000-0002-3947-1948)
- Adrian Chasin (ORCID: https://orcid.org/0000-0002-9940-0260)
- Nouredine Rassoul (ORCID: https://orcid.org/0000-0001-9489-3396)
- Gouri Sankar Kar (ORCID: https://orcid.org/0000-0003-3122-4237)
Institutions
- IMEC (BE)
Publication Details
- Published
- 2025-03-30
- DOI
- https://doi.org/10.1109/irps48204.2025.10983521
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00