A New Methodology to Evaluate Die-Package Level Load-Pull and Ruggedness for RF Long Term Aging for 5G Applications
A new and improved methodology to perform RF long term stress and aging on packaged-die in CMOS technologies is demonstrated under impedance match and mismatch configuration. QFN packaged Power Amplifier (PA) with isoLDMOS as Common Gate operating at 6 GHz 5V VDD is used as a reference design. Package-die load pull using phase shifters improved RF t0 performance and further compared with waferlevel design. RF long term stress showed initial degradation followed by so-called “improvement” after stress, which is correlated to IDD shift. VSWR ruggedness at package-die level was developed using a customized tuner. Pre and post ruggedness PA sweeps after a 3-loop measurement under ∼3:1 ratio showed negligible degradation. Overall, good long-term reliability of 5V isoLDMOS 22FDX is demonstrated, using packaged-die based Load Pull and VSWR ruggedness characterization.
Authors
- Oscar H. Gonzalez
- Oscar D. Restrepo (ORCID: https://orcid.org/0000-0003-4804-2966)
- P. Srinivasan (ORCID: https://orcid.org/0000-0002-9973-5212)
- S. Moss
- S. Ludvik
- J. Lestage
Institutions
- GlobalFoundries (United States) (US)
Publication Details
- Published
- 2025-03-30
- DOI
- https://doi.org/10.1109/irps48204.2025.10982771
- Primary Topic
- Electronic Packaging and Soldering Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00