Investigation of the Time-Dependent BTI-induced Degradation Distribution for Ring Oscillators in Ultra-Long-Term Stress Conditions
BTI-induced degradation of 65 nm FDSOI ring oscillators (ROs) was measured using a long-term measurement system. Temperature and supply voltage were set to 125°C and a nominal voltage of 1.2 V, respectively. Over a measurement period of 300 days, the average BTI-induced degradation exhibited a power-law behavior. The frequency distributions of 840 ROs transitioned from a Gaussian distribution at the short time to multiple Gaussian distributions at the long time. This shift is attributed to two distinct degradation mechanisms; defects close to the interface and those in proximity to the gate. Although the averaged BTI-induced degradation follows a power-law function. As stress time increased, RTN-induced frequency variations also increased, which makes the frequency distributions wider as stress time.
Authors
- Kazutoshi Kobayashi (ORCID: https://orcid.org/0000-0002-7139-7274)
- Ryo Kishida
- Tomoharu Kishita
Institutions
- Kyoto Institute of Technology (JP)
- Toyama Prefectural University (JP)
Publication Details
- Published
- 2025-03-30
- DOI
- https://doi.org/10.1109/irps48204.2025.10982758
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00