Investigation of the Time-Dependent BTI-induced Degradation Distribution for Ring Oscillators in Ultra-Long-Term Stress Conditions

BTI-induced degradation of 65 nm FDSOI ring oscillators (ROs) was measured using a long-term measurement system. Temperature and supply voltage were set to 125°C and a nominal voltage of 1.2 V, respectively. Over a measurement period of 300 days, the average BTI-induced degradation exhibited a power-law behavior. The frequency distributions of 840 ROs transitioned from a Gaussian distribution at the short time to multiple Gaussian distributions at the long time. This shift is attributed to two distinct degradation mechanisms; defects close to the interface and those in proximity to the gate. Although the averaged BTI-induced degradation follows a power-law function. As stress time increased, RTN-induced frequency variations also increased, which makes the frequency distributions wider as stress time.

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Publication Details

Published
2025-03-30
DOI
https://doi.org/10.1109/irps48204.2025.10982758
Primary Topic
Semiconductor materials and devices
Type
article
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article

Investigation of the Time-Dependent BTI-induced Degradation Distribution for Ring Oscillators in Ultra-Long-Term Stress Conditions

Kazutoshi Kobayashi, Ryo Kishida, Tomoharu Kishita
Semiconductor materials and devices
article

Investigation of the Time-Dependent BTI-induced Degradation Distribution for Ring Oscillators in Ultra-Long-Term Stress Conditions

Kazutoshi Kobayashi, Ryo Kishida, Tomoharu Kishita
article en

Abstract

BTI-induced degradation of 65 nm FDSOI ring oscillators (ROs) was measured using a long-term measurement system. Temperature and supply voltage were set to 125°C and a nominal voltage of 1.2 V, respectively. Over a measurement period of 300 days, the average BTI-induced degradation exhibited a power-law behavior. The frequency distributions of 840 ROs transitioned from a Gaussian distribution at the short time to multiple Gaussian distributions at the long time. This shift is attributed to two distinct degradation mechanisms; defects close to the interface and those in proximity to the gate. Although the averaged BTI-induced degradation follows a power-law function. As stress time increased, RTN-induced frequency variations also increased, which makes the frequency distributions wider as stress time.

Kyoto Institute of Technology (JP), Toyama Prefectural University (JP)
Openalex Percentile: Top 91%
Semiconductor materials and devices
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