A Study on the Origin of Dynamic Charge Loss of Next Generation DRAM Cell Array Transistor

Dynamic charge loss of next generation DRAM with a cell array transistor consisting of a bulk-less thin body was studied. The relationship between dynamic charge loss and floating body effect during bit line disturbance was shown by experimental and simulation results. It is necessary to minimize both the SN contact GIDL and the BL node contact GIDL in order to manage ‘d0’ and ‘d1’ dynamic operation characteristics simultaneously.

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Published
2025-03-30
DOI
https://doi.org/10.1109/irps48204.2025.10982816
Primary Topic
Semiconductor materials and interfaces
Type
article
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A Study on the Origin of Dynamic Charge Loss of Next Generation DRAM Cell Array Transistor

Jemin Park, Jaihyuk Song, Jeong‐Hoon Oh, Moonyoung Jeong et al.
2 links
Semiconductor materials and interfaces
article

A Study on the Origin of Dynamic Charge Loss of Next Generation DRAM Cell Array Transistor

Jemin Park, Jaihyuk Song, Jeong‐Hoon Oh, Moonyoung Jeong, Hyungjun Noh, Sangho Lee, Yootak Jun
article en

Abstract

Dynamic charge loss of next generation DRAM with a cell array transistor consisting of a bulk-less thin body was studied. The relationship between dynamic charge loss and floating body effect during bit line disturbance was shown by experimental and simulation results. It is necessary to minimize both the SN contact GIDL and the BL node contact GIDL in order to manage ‘d0’ and ‘d1’ dynamic operation characteristics simultaneously.

Samsung (South Korea) (KR)
Affordable and clean energy
Openalex Percentile: Top 92%
Semiconductor materials and interfaces
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