Characterization and Modeling of Fully Depleted SOI Varactor With Independently Controlled Front- and Back-Gates for RF Applications

In this work, we have explored the influence of back-gate voltage on the terminal characteristics of fully depleted silicon-on-insulator (FDSOI) varactors, which are crucial for RF applications. We characterized 28-nm FDSOI varactors in terms of both ac and RF performance. Experimental results highlight the significant effect of back-gate voltage on device behavior, revealing transitions between different operational modes, such as accumulation, depletion, and inversion. Unique features observed in the ultrathin body and box (UTBB) FDSOI varactor, including a hump in gate capacitance, distinct series resistance trends, and quality factor variations, have been extensively analyzed over a wide range of back-gate biases, spanning from strongly negative to strongly positive. In addition, a phenomenological model based on the physical parameters of the device is introduced and has been successfully validated with the industry hardware data, showing excellent correlation. The model accurately predicts key performance metrics, including capacitance and quality factors, over a broad bias and frequency range. To extend the utility of the model for accumulation mode varactors, a model of series resistance is proposed and validated with TCAD simulation results. This model, implemented in Verilog-A, can be readily integrated into standard circuit simulators.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2025-05-15
DOI
https://doi.org/10.1109/ted.2025.3566930
Citations
1
Primary Topic
Radio Frequency Integrated Circuit Design
Type
article
Field-Weighted Citation Impact
0.73

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article

Characterization and Modeling of Fully Depleted SOI Varactor With Independently Controlled Front- and Back-Gates for RF Applications

Debashish Nandi, Wajid Manzoor, Yogesh Singh Chauhan, Aloke K. Dutta et al.
1 citations
IEEE Transactions on Electron Devices
Radio Frequency Integrated Circuit Design
0.73
article

Characterization and Modeling of Fully Depleted SOI Varactor With Independently Controlled Front- and Back-Gates for RF Applications

Debashish Nandi, Wajid Manzoor, Yogesh Singh Chauhan, Aloke K. Dutta, Nisha Manzoor
article en
1 citations

Abstract

In this work, we have explored the influence of back-gate voltage on the terminal characteristics of fully depleted silicon-on-insulator (FDSOI) varactors, which are crucial for RF applications. We characterized 28-nm FDSOI varactors in terms of both ac and RF performance. Experimental results highlight the significant effect of back-gate voltage on device behavior, revealing transitions between different operational modes, such as accumulation, depletion, and inversion. Unique features observed in the ultrathin body and box (UTBB) FDSOI varactor, including a hump in gate capacitance, distinct series resistance trends, and quality factor variations, have been extensively analyzed over a wide range of back-gate biases, spanning from strongly negative to strongly positive. In addition, a phenomenological model based on the physical parameters of the device is introduced and has been successfully validated with the industry hardware data, showing excellent correlation. The model accurately predicts key performance metrics, including capacitance and quality factors, over a broad bias and frequency range. To extend the utility of the model for accumulation mode varactors, a model of series resistance is proposed and validated with TCAD simulation results. This model, implemented in Verilog-A, can be readily integrated into standard circuit simulators.

IEEE Transactions on Electron DevicesVol. 72(7)
Indian Institute of Technology Kanpur (IN)
Science and Engineering Research Board
Openalex Percentile: Top 28%
Radio Frequency Integrated Circuit Design
0.73
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Characterization and Modeling of Fully Depleted SOI Varactor With Independently Controlled Front- and Back-Gates for RF Applications — Debashish Nandi, Wajid Manzoor, et al. · IEEE Transactions on Electron Devices (2025) | TGRS Research Map | TGRS