Direct-patterning SnO <sub>2</sub> deposition by atomic-layer additive manufacturing
The ALD precursor tetrakis(dimethylamido)tin and water are exploited towards the atomic-layer additive manufacturing (ALAM) of SnO 2 lines.
Authors
- Julien Bachmann (ORCID: https://orcid.org/0000-0001-6480-6212)
- Ivan Kundrata
- Erdmann Spiecker (ORCID: https://orcid.org/0000-0002-2723-5227)
- Johannes Will (ORCID: https://orcid.org/0000-0003-0326-9913)
- Mingjian Wu (ORCID: https://orcid.org/0000-0003-2113-0245)
- Sonja Kürten
- Kimia Hashemizadeh
Institutions
- Friedrich-Alexander-Universität Erlangen-Nürnberg (DE)
- Institute of Electrical Engineering of the Slovak Academy of Sciences (SK)
Publication Details
- Journal
- Materials Advances
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ma00182j
- Citations
- 2
- Primary Topic
- ZnO doping and properties
- Type
- article
- Field-Weighted Citation Impact
- 1.04
Funders
- Deutsche Forschungsgemeinschaft