Generalized Phase Tailoring of Arbitrary Orthogonal Polarizations in Meta‐Structure with High‐Order Geometric Symmetry

Symmetry, a core principle of aesthetics, plays a crucial role in both physics and mathematics. Recent investigations into high-symmetry meta-structures (Cm, m ≥ 3) have revealed intriguing concepts and phenomena in optics and materials science. However, increasing symmetry introduces challenges in tailoring anisotropy, limiting the potential of highly symmetric structures for functional wavefront engineering. While nonlinear geometric Berry phase and generalized geometric phase have enabled circular polarization control in Cm (m ≥ 3) meta-structures, these approaches are inherently spin-dependent and restricted to circular polarization states. Here, shape tailoring, including modifications to unit cell dimension and Cm meta-structure parameters is presented, to effectively enhance the anisotropy and phase control capabilities of Cm (m ≥ 3) meta-structures. By further incorporating generalized geometric phase, independent phase control of arbitrary orthogonal polarization states is achieved, and validated both numerically and experimentally. This generalized framework enhances the wavefront tailoring capacity of Cm (m ≥ 3) meta-structures and has substantial potential for integrating flexible wavefront functions with high-symmetry-driven exotic phenomena. Moreover, this approach offers inspiration for further applications in fields such as condensed matter physics and materials science, i.e., integrating the symmetry of the unit cell and lattice.

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Publication Details

Journal
Advanced Science
Published
2025-05-14
DOI
https://doi.org/10.1002/advs.202504918
Citations
9
Primary Topic
Metamaterials and Metasurfaces Applications
Type
article
Field-Weighted Citation Impact
3.85

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article

Generalized Phase Tailoring of Arbitrary Orthogonal Polarizations in Meta‐Structure with High‐Order Geometric Symmetry

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9 citations
Advanced Science
Metamaterials and Metasurfaces Applications
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article

Generalized Phase Tailoring of Arbitrary Orthogonal Polarizations in Meta‐Structure with High‐Order Geometric Symmetry

Junming Zhao, Tian Jiang, Weixu Yang, Qi Hu, Ke Chen, Yijun Feng, Kai Qu
article en
9 citations

Abstract

Symmetry, a core principle of aesthetics, plays a crucial role in both physics and mathematics. Recent investigations into high-symmetry meta-structures (Cm, m ≥ 3) have revealed intriguing concepts and phenomena in optics and materials science. However, increasing symmetry introduces challenges in tailoring anisotropy, limiting the potential of highly symmetric structures for functional wavefront engineering. While nonlinear geometric Berry phase and generalized geometric phase have enabled circular polarization control in Cm (m ≥ 3) meta-structures, these approaches are inherently spin-dependent and restricted to circular polarization states. Here, shape tailoring, including modifications to unit cell dimension and Cm meta-structure parameters is presented, to effectively enhance the anisotropy and phase control capabilities of Cm (m ≥ 3) meta-structures. By further incorporating generalized geometric phase, independent phase control of arbitrary orthogonal polarization states is achieved, and validated both numerically and experimentally. This generalized framework enhances the wavefront tailoring capacity of Cm (m ≥ 3) meta-structures and has substantial potential for integrating flexible wavefront functions with high-symmetry-driven exotic phenomena. Moreover, this approach offers inspiration for further applications in fields such as condensed matter physics and materials science, i.e., integrating the symmetry of the unit cell and lattice.

Advanced ScienceVol. 12(28)
Nanjing University (CN)
National Natural Science Foundation of China, Priority Academic Program Development of Jiangsu Higher Education Institutions, Jiangsu Provincial Key Research and Development Program, Jiangsu Provincial Key Laboratory of Advanced Manipulating Technique of Electromagnetic Wave, Fundamental Research Funds for the Central Universities
Openalex Percentile: Top 6%
Metamaterials and Metasurfaces Applications
3.85
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