Se-mediated dry transfer of wafer-scale 2D semiconductors for advanced electronics

Two-dimensional (2D) semiconductors hold a great promise for next-generation electronics. Yet, achieving a clean and intact transfer of 2D films on device-compatible substrates remains a critical challenge. Here, we report an approach that uses selenium (Se) as the intermediate layer to facilitate the transfer of wafer-scale molybdenum disulfide (MoS<sub>2</sub>) monolayers on target substrates with high surface/interface cleanness and structural integrity. Our method enables nearly 100% film intactness of the transferred 2D semiconductors which are free from residues or contaminants. Characterizations reveal that the Se-assisted dry-transfer yields MoS<sub>2</sub> film with superior quality compared to conventional transfer techniques. The fabricated field-effect transistors (FETs) and logic circuits based on these transferred films demonstrate remarkable electrical performance, including on/off current ratios up to 2.7×10<sup>10</sup> and electron mobility of 71.3 cm<sup>2</sup>·V<sup>-1</sup>·s<sup>-1</sup> for individual FETs. Our results underscore the feasibility of this dry-transfer technology for fabricating high-performance 2D electronics that are fully compatible with standard semiconductor processes, paving the way for integrating 2D materials into advanced electronic applications.

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Publication Details

Journal
Nature Communications
Published
2025-05-14
DOI
https://doi.org/10.1038/s41467-025-59803-1
Citations
13
Primary Topic
Graphene research and applications
Type
article
Field-Weighted Citation Impact
6.73

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article

Se-mediated dry transfer of wafer-scale 2D semiconductors for advanced electronics

Shuopei Wang, Lanying Zhou, Na Li, Liang‐Feng Huang et al.
13 citations
Nature Communications
Graphene research and applications
6.73
article

Se-mediated dry transfer of wafer-scale 2D semiconductors for advanced electronics

Shuopei Wang, Lanying Zhou, Na Li, Liang‐Feng Huang, Xingchao Zhang, Jiaojiao Zhao, Guangyu Zhang, Peng Chen, Hua Yu, Yuchao Zhou, Hongyue Du, Tong Li, Jieying Liu
article en
13 citations

Abstract

Two-dimensional (2D) semiconductors hold a great promise for next-generation electronics. Yet, achieving a clean and intact transfer of 2D films on device-compatible substrates remains a critical challenge. Here, we report an approach that uses selenium (Se) as the intermediate layer to facilitate the transfer of wafer-scale molybdenum disulfide (MoS<sub>2</sub>) monolayers on target substrates with high surface/interface cleanness and structural integrity. Our method enables nearly 100% film intactness of the transferred 2D semiconductors which are free from residues or contaminants. Characterizations reveal that the Se-assisted dry-transfer yields MoS<sub>2</sub> film with superior quality compared to conventional transfer techniques. The fabricated field-effect transistors (FETs) and logic circuits based on these transferred films demonstrate remarkable electrical performance, including on/off current ratios up to 2.7×10<sup>10</sup> and electron mobility of 71.3 cm<sup>2</sup>·V<sup>-1</sup>·s<sup>-1</sup> for individual FETs. Our results underscore the feasibility of this dry-transfer technology for fabricating high-performance 2D electronics that are fully compatible with standard semiconductor processes, paving the way for integrating 2D materials into advanced electronic applications.

Nature CommunicationsVol. 16(1)
Chinese Academy of Sciences (CN), Southern University of Science and Technology (CN), Songshan Lake Materials Laboratory (CN), FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic (CZ), Institute of Physics (CN), National Laboratory for Superconductivity (CN), University of Chinese Academy of Sciences (CN)
National Science Foundation, National Natural Science Foundation of China, National Postdoctoral Program for Innovative Talents, National Key Research and Development Program of China
Industry, innovation and infrastructure
Openalex Percentile: Top 3%
Graphene research and applications
6.73
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