Characterization and simulation of laser-induced contamination effects on laser beam propagation in the UV sub-picosecond regime
This study investigates the effects of laser-induced contamination (LIC) on ultraviolet (UV) laser beam propagation in the sub-picosecond regime. Using a sub-picosecond UV laser source operating at 343 nm with 30 W of mean power at 800 kHz, we examine the influence of prolonged UV exposure on the degradation of beam quality. The experiments are carried out on calcium fluoride (<i>C</i><i>a</i><i>F</i><sub>2</sub>) substrates, where contamination deposits are induced by high-power UV radiation under ambient air. We characterize the chemical composition, physical structure, and optical properties of the deposit. A numerical model is developed to simulate the influence of a phase defect corresponding to the LIC deposit and to estimate its impact on beam quality by calculating <i>M</i><sup>2</sup> and beam intensity distribution. This study highlights the challenges posed by contamination when using high-power ultraviolet laser sources, particularly in industrial, and space applications.
Authors
- Jules Herbuvaux
- Julien Nillon
- Serge Monneret (ORCID: https://orcid.org/0000-0002-3093-9161)
- Laurent Gallais (ORCID: https://orcid.org/0000-0002-6806-4313)
- Luis Alonso Vazquez-Zuniga
- Clemens Hoenninger
- Frank Wagner (ORCID: https://orcid.org/0000-0003-4837-483X)
Institutions
- Amplitude Systèmes (France) (FR)
Publication Details
- Journal
- Applied Optics
- Published
- 2025-05-14
- DOI
- https://doi.org/10.1364/ao.559241
- Primary Topic
- Laser Material Processing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00