High-Efficiency and Low Back-Reflection Fully Etched TM Mode Silicon Waveguide Grating Coupler
We propose a novel design for high-performance fully etched TM waveguide grating coupler with minimum feature size above 260 nm. The device has low back reflection and high efficiency.
Authors
- Xuetong Zhou (ORCID: https://orcid.org/0000-0003-1685-0301)
- Hon Ki Tsang (ORCID: https://orcid.org/0000-0003-2777-1537)
- Kei May Lau (ORCID: https://orcid.org/0000-0002-7713-1928)
- Xiankai Sun (ORCID: https://orcid.org/0000-0002-9137-0298)
- Ziyao Feng (ORCID: https://orcid.org/0000-0003-0268-9211)
- Jianfeng He (ORCID: https://orcid.org/0000-0001-6995-2980)
- Ying Xue (ORCID: https://orcid.org/0000-0001-6622-9762)
- Fan Ye
Institutions
- Chinese University of Hong Kong (HK)
- Hong Kong University of Science and Technology (HK)
Publication Details
- Published
- 2025-04-14
- DOI
- https://doi.org/10.1109/siphotonics64386.2025.10984596
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00