Low-Resistivity Ohmic Contact on p-GaN/AlGaN/GaN Enabled by Mg-Doped Spin-on-Glass Treatment
Mg-doped spin-on-glass (SOG) treatment is employed as a simple and effective Mg doping method, which can lower the barrier height of p-GaN/metal and form robust Ni/Au Ohmic contact on p-GaN/AlGaN/GaN structure. After SOG treatment annealed at 870°C, the specific contact resistivity and contact resistivity of Ni/Au metal stack decreased from 1.3 × 10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−3</sup> Ω·cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> to 1.2 × 10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−4</sup> Ω·cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> and from 78.2 Ω·mm to 22.5 Ω·mm, respectively. The SOG treatment maintained a good surface morphology and effectively increased Mg concentration near the p-GaN surface, which could in situ decompose the dense GaO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">X</sub> layer. In addition, the SOG treatment facilitated Ga out-diffusion from p-GaN layer, and the inversion process induced by Ni/Au-based p-GaN Ohmic annealing is more complete, ultimately forming a p-GaN/Au/NiO Ohmic stack with a favorable atomic arrangement interface. These results demonstrate the significant potential of SOG technology in the selective doping of p-GaN.
Authors
- MuJun Li (ORCID: https://orcid.org/0009-0005-5358-4921)
- Chuying Tang (ORCID: https://orcid.org/0000-0003-4884-3333)
- Fangzhou Du (ORCID: https://orcid.org/0000-0002-8151-8092)
- Honghao Lu (ORCID: https://orcid.org/0000-0002-4607-7180)
- Qing Wang (ORCID: https://orcid.org/0000-0002-5478-5662)
- Chun Fu
- Hongyu Yu (ORCID: https://orcid.org/0000-0002-5756-868X)
- Wenchuan Tao
Institutions
- Southern University of Science and Technology (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-05-09
- DOI
- https://doi.org/10.1109/led.2025.3567125
- Citations
- 2
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 2.52
Funders
- National Natural Science Foundation of China