Structural and optical properties of facet-controlled MOVPE grown c-GaN on <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> (100) substrates

Abstract This study reports the structural and optical characterisation of GaN layers grown on β -Ga 2 O 3 substrates using a three-step facet-controlled MOVPE growth process. Surface morphology was analyzed using AFM and SEM, while high-resolution XRD provided insights into structural quality and orientation. Orientational dependence in the planar direction was obtained from the diffraction pattern at the GaN/ β -Ga 2 O 3 interface. TEM and STEM imaging revealed dislocation densities and their reduction at the facet layer. Oxygen and nitrogen diffusion at the GaN/ β -Ga 2 O 3 interface was determined using EELS measurements, while optical properties were assessed using temperature-dependent photoluminescence and ellipsometry.

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Publication Details

Journal
Semiconductor Science and Technology
Published
2025-05-09
DOI
https://doi.org/10.1088/1361-6641/add6ce
Citations
1
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.43

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Structural and optical properties of facet-controlled MOVPE grown c-GaN on β-Ga2O3 (100) substrates

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article

Structural and optical properties of facet-controlled MOVPE grown c-GaN on β-Ga2O3 (100) substrates

A. Thamizhavel, A. Azizur Rahman, Bhagyashree A. Chalke, Nilesh Kulkarni, Arnab Bhattacharya, Maneesha Narayanan, Emroj Hossain, Jayesh B. Parmar
article en
1 citations

Abstract

Abstract This study reports the structural and optical characterisation of GaN layers grown on β -Ga 2 O 3 substrates using a three-step facet-controlled MOVPE growth process. Surface morphology was analyzed using AFM and SEM, while high-resolution XRD provided insights into structural quality and orientation. Orientational dependence in the planar direction was obtained from the diffraction pattern at the GaN/ β -Ga 2 O 3 interface. TEM and STEM imaging revealed dislocation densities and their reduction at the facet layer. Oxygen and nitrogen diffusion at the GaN/ β -Ga 2 O 3 interface was determined using EELS measurements, while optical properties were assessed using temperature-dependent photoluminescence and ellipsometry.

Semiconductor Science and TechnologyVol. 40(6)
Tata Institute of Fundamental Research (IN)
Department of Atomic Energy, Government of India
Openalex Percentile: Top 42%
Ga2O3 and related materials
0.43
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