Inspection of Bulk Crystals for Quality Control in Crystal Growth: Assessment of High-Energy X-Ray Transmission Topography and Back-Reflection Topography Pinpointed for Physical Vapor Transport-Grown Aluminum Nitride
A comprehensive X-ray topography analysis of two selected aluminum nitride (AlN) bulk crystals is presented. We compare surface inspection X-ray topography in back-reflection geometry with high-energy transmission topography in the Lang and Laue configuration using the monochromatic Kα1 excitation wavelength of copper, silver, and tungsten, respectively. A detailed comparison of the results allows the assessment of both the high- and low-energy X-ray topography methods with respect to performance and structural information, giving essential feedback for crystal growth. This is demonstrated for two selected AlN freestanding faceted crystals up to 8 mm in thickness grown in all directions using the physical vapor transport (PVT) method. Structural defects of all facets of the crystals are determined using the X-ray topography in back-reflection geometry. The mean threading dislocation densities are 480 ± 30 cm−2 for both crystals of either the Al- or N-face. Clustering of dislocations could be observed. The m-facets show the presence of basal plane dislocations and their accumulation as clusters. The integral transmission topographs of the 101¯0 (m-plane) reflection family show that basal plane dislocations of the screw type in 131¯21¯0 directions decorate threading dislocation clusters. Three-dimensional section transmission topography reveals that the basal plane dislocation clusters mainly originate at the seed boundary and propagate in the 131¯21¯0 direction along the growth front. In newly laterally grown material, the Borrmann effect has been observed for the first time in PVT-grown bulk AlN, indicating very high structural perfection of the crystalline material in this region. This agrees with a low mean FWHM of 10.6 arcsec of the 101¯0 reflection determined through focused high-energy Laue transmission mappings. The latter method also opens the analysis of the ∆2θ-shift correlated to the residual stress distribution inside the bulk crystal, which is dominated by dislocation clusters. Contrary to Lang transmission topography, the de-focused high-energy Laue transmission penetrates the 8 mm-thick crystal enabling a defect analysis in the bulk.
Authors
- M. Weißer
- Roland Weingärtner
- A. G. Lesnik (ORCID: https://orcid.org/0000-0002-6610-8757)
- Elke Meißner (ORCID: https://orcid.org/0000-0003-2113-7690)
- G. Lukin
- Stephan G. Mueller (ORCID: https://orcid.org/0000-0002-1383-5715)
- Boris M. Epelbaum
- Sven Besendörfer (ORCID: https://orcid.org/0000-0002-9704-0732)
- Leon Schiller
Institutions
- Schott (Germany) (DE)
- Friedrich-Alexander-Universität Erlangen-Nürnberg (DE)
- Fraunhofer Institute for Integrated Systems and Device Technology (DE)
Publication Details
- Journal
- Crystals
- Published
- 2025-05-09
- DOI
- https://doi.org/10.3390/cryst15050449
- Citations
- 1
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 1.26